Pattern measuring method and pattern measuring device

Abstract

A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.

1 . A pattern measuring method for acquiring an image of a pattern on a specimen and measuring the pattern on the image, the pattern measuring method comprising the steps of:
 acquiring an image of a reference pattern arranged at a position isolated from a measuring point on the specimen; and   setting a reference position for the measurement based on a position of the reference pattern on the image and based on design data for a portion including the reference pattern and the measuring point.