Projection exposure apparatus, projection exposure method, and method for producing device

Abstract

A projection exposure apparatus transfers a pattern formed on a mask onto a substrate via a projection optical system. The projection exposure apparatus includes electricity removal units which removes electricity from a liquid supplied to a space between the projection optical system and the surface of a substrate. This makes it possible to prevent destruction of the circuit pattern or malfunction of the device which would otherwise caused by charging of the liquid.

1 . A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:
 a projection optical system which projects an image of the pattern onto the substrate; and   an electricity removal unit which removes electricity from the liquid to be supplied to a space between the projection optical system and a surface of the substrate.