Semiconductor device manufacturing apparatus and manufacturing method

Abstract

An apparatus for manufacturing semiconductor devices includes: a cabinet having an opening section on a front surface thereof; a front door that is provided at the opening section of the cabinet in a manner to be freely opened and closed; a low oxygen gas intake port for introducing nitrogen gas or gas with an oxygen concentration lower than a concentration of oxygen contained in an air atmosphere; a gas exhaust port for exhausting the gas from within the cabinet; a ventilation system that introduces the air atmosphere or oxygen into the cabinet; a lock system that is capable of locking the front door in a closed state; and a detector that detects oxygen concentration within the cabinet, wherein the lock system unlocks the front door when the oxygen concentration detected by the detector becomes a predetermined value or higher.

1 . An apparatus for manufacturing semiconductor devices, comprising:
 a cabinet having an opening section on a front surface thereof;   a front door that is provided at the opening section of the cabinet in a manner to be freely opened and closed;   a low oxygen gas intake port for introducing nitrogen gas or gas with an oxygen concentration lower than a concentration of oxygen contained in an air atmosphere;   a gas exhaust port for exhausting the gas from within the cabinet;   a ventilation system that introduces the air atmosphere or oxygen into the cabinet;   a lock system that is capable of locking the front door in a closed state; and   a detector that detects oxygen concentration within the cabinet, wherein the lock system unlocks the front door when the oxygen concentration detected by the detector becomes a predetermined value or higher.   
   
   
       2 . An apparatus for manufacturing semiconductor devices, comprising:
 a cabinet having an opening section on a front surface thereof;   a front door that is provided at the opening section of the cabinet in a manner to be freely opened and closed;   a low oxygen gas intake port for introducing nitrogen gas or gas with an oxygen concentration lower than a concentration of oxygen contained in an air atmosphere;   a gas exhaust port for exhausting the gas from within the cabinet;   a ventilation system that introduces the air atmosphere or oxygen into the cabinet;   a lock system that is capable of locking the front door in a closed state; and   a timer that starts time measurement upon operation of the ventilation system, wherein the lock system unlocks the front door when a time measured by the timer reaches a predetermined time.   
   
   
       3 . An apparatus for manufacturing semiconductor devices, comprising:
 a cabinet having an opening section on a front surface thereof;   a front door that is provided at the opening section of the cabinet in a manner to be freely opened and closed;   a low oxygen gas intake port for introducing nitrogen gas or gas with an oxygen concentration lower than a concentration of oxygen contained in an air atmosphere;   a gas exhaust port for exhausting the gas from within the cabinet;   a mesh door that is provided at the opening section of the cabinet in a manner to be freely opened and closed, and provided inside the front door;   a detector that detects an oxygen concentration within the cabinet; and   a lock system that is capable of locking the mesh door in a closed state, wherein the lock system unlocks the mesh door when the oxygen concentration detected by the detector becomes a predetermined value or higher.   
   
   
       4 . An apparatus for manufacturing semiconductor devices according to  claim 1 , wherein an alarm device is provided instead of the lock system, and the alarm device alarms when the oxygen concentration detected by the detector becomes a predetermined value or higher. 
   
   
       5 . An apparatus for manufacturing semiconductor devices according to  claim 2 , wherein an alarm device is provided instead of the lock system, and the alarm device alarms when the time measured by the timer reaches a predetermined time. 
   
   
       6 . An apparatus for manufacturing semiconductor devices according to  claim 3 , further comprising a ventilation system for introducing the air atmosphere or oxygen into the cabinet. 
   
   
       7 . An apparatus for manufacturing semiconductor devices according to  claim 1 , wherein the ventilation system includes at least one of a compressed air jet nozzle and an air atmosphere intake port equipped with a suction fan. 
   
   
       8 . An apparatus for manufacturing semiconductor devices according to  claim 7 , wherein the ventilation system includes an exhaust fan provided at the gas exhaust port. 
   
   
       9 . An apparatus for manufacturing semiconductor devices according to  claim 8 , wherein the exhaust fan is provided at a position higher than a position of the suction fan within the cabinet.