Processing apparatus with an electromagnetic launch

Abstract

A processing apparatus, such as a microwave-based processing apparatus. The apparatus includes a vessel having an inner surface defining a chamber configured to hold a reaction mixture, a guide, and a launch coupled to the guide. The guide can be at least partially disposed in the vessel, and is configured to propagate electromagnetic energy. The launch is configured to couple at least a portion of the electromagnetic energy from the guide to the reaction mixture. Example launches include a dielectric window and a projection. Example projections include a metallic projection and a dielectric projection.

1 - 18 . (canceled) 
   
   
       19 . A radio frequency (RF) reactor system comprising:
 a vessel including an inner surface defining a chamber configured to hold a reaction mixture;   a RF generator;   a first dielectric-filled waveguide and a second dielectric-filled waveguide coupled to the RF generator and at least partially disposed within the vessel, each of the first dielectric-filled waveguide and the second dielectric-filled waveguide being configured to propagate RF energy;   a first launch and a second launch coupled to the first dielectric-filled waveguide, each of the first launch and the second launch being configured to launch a portion of the RF energy propagated by the first dielectric-filled waveguide; and   a third launch and a fourth launch coupled to the second dielectric-filled waveguide, each of the third launch and the fourth launch being configured to launch a portion of the RF energy propagated by the second waveguide.   
   
   
       20 . The apparatus of  claim 19 , wherein the vessel further includes a port configured to introduce at least one reactant with or without at least one catalyst to the chamber and to release at least one product with or without at least one catalyst from the chamber. 
   
   
       21 . The apparatus of  claim 19 , wherein the first launch includes a window. 
   
   
       22 . The apparatus of  claim 19 , wherein the first launch includes a projection. 
   
   
       23 . The apparatus of  claim 19 , wherein the first launch includes a metallic projection. 
   
   
       24 . The apparatus of  claim 23 , wherein the projection further includes a dielectric material at least partially surrounding the metallic projection. 
   
   
       25 . The apparatus of  claim 19 , wherein the first launch includes a dielectric projection. 
   
   
       26 . The apparatus of  claim 19 , wherein the first dielectric-filled waveguide includes a filling comprising at least one of quartz, alumina, silica, boron nitride, aluminum nitride, Teflon, and partially evacuated vacuum. 
   
   
       27 . The apparatus of  claim 19 , wherein the first dielectric-filled waveguide includes a RF transparent gaseous dielectric filling. 
   
   
       28 . The apparatus of  claim 19 , wherein the RF generator comprises a first RF generator and a second RF generator, wherein the first dielectric-filled waveguide is coupled to the first RF generator, and wherein the second dielectric-filled waveguide is coupled to the second RF generator. 
   
   
       29 - 51 . (canceled)