US2009159924A1PendingUtilityA1

Semiconductor light emitting element and method for fabricating the same

Assignee: PANASONIC CORPPriority: Jan 19, 1995Filed: Feb 24, 2009Published: Jun 25, 2009
Est. expiryJan 19, 2015(expired)· nominal 20-yr term from priority
Y10S257/918H01S 5/32308H01S 5/32341H01S 5/3403H01S 5/0213H01S 5/2237H01S 5/0207H01S 5/3201H01S 5/2068H01S 5/3203H01S 5/320225H01S 5/24H01S 5/2232H01S 5/2201H01S 2304/04H01S 2304/12H01S 2301/173B82Y 20/00Y10T428/12528H01S 5/34333H10H 20/825H10H 20/817H01S 5/0237
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Claims

Abstract

The semiconductor laser of this invention includes an active layer formed in a c-axis direction, wherein the active layer is made of a hexagonal-system compound semiconductor, and anisotropic strain is generated in a c plane of the active layer.

Claims

exact text as granted — not AI-modified
1 . A semiconductor light emitting element, comprising:
 a semiconductor substrate of a hexagonal crystalline system, including a principal plane which has a plane direction tilted with respect to a (0001) plane direction; and   an active layer of Al x Ga y In z N (0≦x≦1, 0≦y≦1, 0≦z≦1) arranged on the principal plane of the semiconductor substrate and composed of wurtzite-type crystal.   
     
     
         2 . A semiconductor light emitting element according to  claim 1 , wherein the active layer has a stress in an in-plane direction of the principal plane of the semiconductor substrate. 
     
     
         3 . A semiconductor light emitting element according to  claim 1 , wherein the principal plane of the semiconductor substrate is a (1100) plane, a (1120) plane or an R plane. 
     
     
         4 . A semiconductor light emitting element according to  claim 1 , wherein the active layer includes a well layer and a barrier layer.

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