US2009142607A1PendingUtilityA1
Copper clad laminate
Est. expiryApr 4, 2025(expired)· nominal 20-yr term from priority
H05K 1/036B29C 48/08H05K 2201/0355H05K 2201/0154B32B 2457/00B32B 2311/12B32B 2307/306B32B 15/20B32B 2250/40H05K 2203/068H05K 1/0346H05K 2201/0129B32B 27/281H05K 2201/0212B32B 15/08B32B 2379/08B32B 2457/08B29K 2105/256B32B 2309/02B32B 2264/0214Y10T428/31681B32B 2307/54B32B 2309/105B32B 37/04B29C 48/18B32B 15/088B29K 2079/08H05K 3/022H05K 3/025B32B 2250/03B29C 48/16
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Claims
Abstract
A copper-clad laminate is prepared by laminating a copper foil on one side or both sides of a polyimide film by thermocompression bonding. The flexibility of the copper-clad laminate is remarkably improved by employing a polyimide film having a thickness of 5 to 20 μm and a copper foil having a thickness of 1 to 18 μm.
Claims
exact text as granted — not AI-modified1 . A copper-clad laminate prepared by laminating a copper foil on one side or both sides of a polyimide film by thermocompression bonding, wherein
the polyimide film has a thickness of 5 to 20 μm, and the copper foil has a thickness of 1 to 18 μm.
2 . The copper-clad laminate as claimed in claim 1 , wherein
the polyimide film comprises a heat-resistant polyimide layer and a thermoplastic polyimide layer; and the copper foil is laminated on one side or both sides of the heat-resistant polyimide layer via the thermoplastic polyimide layer by thermocompression bonding.
3 . The copper-clad laminate as claimed in claim 1 , wherein the polyimide film has a thickness of 5 to 15 μm.
4 . The copper-clad laminate as claimed in claim 1 , wherein the copper foil is a rolled copper foil having a thickness of 8 to 18 μm.
5 . The copper-clad laminate as claimed in claim 4 , wherein the copper foil is a rolled copper foil having a thickness of 10 to 18 μm.
6 . The copper-clad laminate as claimed in claim 5 , wherein the copper foil is a rolled copper foil having a thickness of 10 to 12 μm.
7 . The copper-clad laminate as claimed in claim 1 , wherein the copper foil is a rolled copper foil having a tensile strength before heat treatment of 300 N/mm 2 or more, and a ratio of tensile strength after heat treatment at 180° C. for 1 hour as defined by the following equation (1) of 33% or less:
Ratio of tensile strength after heat treatment(%)=[(tensile strength after heat treatment)/(tensile strength before heat treatment)]×100 (1)
8 . The copper-clad laminate as claimed in claim 1 , wherein the copper foil is a copper foil with a carrier, in which the copper foil after peeling off the carrier has a thickness of 1 to 5 μm.
9 . A copper-clad laminate prepared by peeling off the carrier from the copper-clad laminate as claimed in claim 8 and then plating it with copper to a thickness of the copper foil of 5 to 8 μm.
10 . The copper-clad laminate as claimed in claim 1 , exhibiting MIT folding endurance of about 2000 times or more.
11 . The copper-clad laminate as claimed in claim 9 , exhibiting MIT folding endurance of about 2000 times or more.
12 . The copper-clad laminate as claimed in claim 1 , wherein the polyimide film is a thermocompression-bonding multilayer polyimide film having a thermoplastic polyimide layer on one side or both sides of a heat-resistant polyimide layer.
13 . The copper-clad laminate as claimed in claim 12 , wherein polyimide particles are dispersed in the thermoplastic polyimide layer.
14 . The copper-clad laminate as claimed in claim 13 , wherein the thermoplastic polyimide layer has polyimide particles with a median size of 0.3 to 0.8 μm and the maximum size of 2 μm or less dispersed within at least a depth of 0.5 μm from its surface in a ratio of about 0.5 to 10% by weight relative to the polyimide in the polyimide surface layer, and is substantially free from an inorganic powder, and
the polyimide film has a friction coefficient of 0.05 to 0.7.
15 . The copper-clad laminate as claimed in claim 13 , wherein the polyimide particles are prepared from a pyromellitic acid component and a p-phenylenediamine component.
16 . The copper-clad laminate as claimed in claim 12 , wherein the polyimide film comprises a thermoplastic polyimide layer with a thickness of 1 to 6 μm on both sides of a heat-resistant polyimide layer with a thickness of 3 to 18 μm.
17 . The copper-clad laminate as claimed in claim 12 , prepared by laminating the thermocompression-bonding multilayer polyimide film and the copper foil by thermocompression bonding under pressure at a temperature of a glass transition temperature of the thermoplastic polyimide to 400° C. both inclusive.
18 . The copper-clad laminate as claimed in claim 12 , wherein the thermocompression-bonding multilayer polyimide film is formed by disposing a thermocompression-bonding polyimide layer on one side or both sides of a heat-resistant polyimide layer and integrating them by coextrusion-flow casting method.
19 . The copper-clad laminate as claimed in claim 1 used for a whole polyimide hinge.
20 . A copper-clad laminate prepared by laminating a copper foil with a thickness of 18 μm or less on a thermocompression-bonding multilayer polyimide film with a thickness of 5 to 25 μm, wherein
the thermocompression-bonding multilayer polyimide film has a thermoplastic polyimide layer, in which polyimide particles are dispersed, on at least one side of a heat-resistant polyimide layer.
21 . A process for continuously manufacturing a copper-clad laminate by laminating a copper foil with a thickness of 1 to 18 μm on a polyimide film with a thickness of 5 to 20 μm, which has a thermoplastic polyimide layer on one side or both sides of a heat-resistant polyimide layer, by thermocompression bonding, comprising:
continuously feeding the polyimide film and the copper foil into a laminating machine such that the copper foil is disposed on the thermoplastic polyimide layer of the polyimide film; and laminating them by thermocompression bonding under pressure at a temperature of a glass transition temperature of the thermoplastic polyimide to 400° C. both inclusive.Join the waitlist — get patent alerts
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