Method of producing a nano-structure and method of producing a magnetic recording medium

Abstract

According to an aspect of an embodiment, a manufacturing method for a nano-structure comprises the steps of: arranging nano-particles on a substrate having a surface provided with a projecting pattern and a recessing pattern; forming cavities under the nano-particles; and polishing the surfaces in which the cavities are formed.

1 . A manufacturing method for a nano structure comprising the steps of:
 arranging nano-particles on a substrate having a surface provided with a projecting pattern and a recessing pattern;   forming cavities under the nano-particles;   removing the nano-particles from the substrate; and   polishing the surface in which the cavities are formed.   
     
     
         2 . The manufacturing method according to  claim 1 , wherein the projecting pattern and the recessing pattern formed on the substrate are formed circularly. 
     
     
         3 . The manufacturing method according to  claim 1 , wherein the polishing step uses chemical mechanical polishing. 
     
     
         4 . The manufacturing method according to  claim 1 , wherein the substrate is a glass substrate or a silicon substrate. 
     
     
         5 . The manufacturing method according to  claim 1 , wherein the substrate is a low-melting glass substrate. 
     
     
         6 . The manufacturing method according to  claim 1 , wherein the nano-particles are made of silica. 
     
     
         7 . The manufacturing method according to  claim 1 , wherein the polishing step is performed so that the surface is polished so as to be flattened. 
     
     
         8 . The manufacturing method according to  claim 1 , wherein a depth of the recessing pattern of the surface is larger than a depth of the cavities. 
     
     
         9 . The manufacturing method according to  claim 1 , wherein a depth of the recessing pattern is not larger than twice the diameter of the nano-particles. 
     
     
         10 . The manufacturing method according to  claim 1 , wherein the surface is provided with a plurality of the projecting patterns and a plurality of the recessing patterns. 
     
     
         11 . The manufacturing method according to  claim 1 , wherein the recessing pattern has a width not larger than 100 nm. 
     
     
         12 . The manufacturing method according to  claim 1 , further comprising cleaning the surface of the substrate after the polishing step. 
     
     
         13 . The manufacturing method according to  claim 1 , wherein the forming step is performed by etching. 
     
     
         14 . The manufacturing method according to  claim 1 , wherein the forming step is performed by plasma ashing treatment. 
     
     
         15 . The manufacturing method according to  claim 1 , wherein the forming step is performed by irradiating light to a resist applied on the surface of the substrate. 
     
     
         16 . The manufacturing method according to  claim 1 , wherein the nano-structure is a master used for production of a magnetic recording medium. 
     
     
         17 . A manufacturing method for a stamper, comprising the steps of:
 arranging nano-particles on a master having a surface provided with a projecting pattern and a recessing pattern;   forming cavities under the nano-particles;   removing the nano-particles from the master;   polishing the surface in which the cavities are formed; and   forming a stamper having a pattern as an inversion of the projecting pattern and the recessing pattern of the surface of the master.   
     
     
         18 . A manufacturing method for a recessing pattern structure comprising the steps of:
 immersing a substrate having a surface provided with a projecting pattern and a recessing pattern in a particle suspension;   pulling up the substrate from the particle suspension;   forming cavities on the substrate masked with particles remaining on the substrate;   removing the particles from the substrate; and   polishing the surface of the substrate to eliminate the cavities.   
     
     
         19 . A manufacturing method for a projecting pattern and a recessing pattern structure comprising the steps of:
 arranging fine particles on a surface of a substrate having a projecting pattern and a recessing pattern in the surface;   etching the surface in a state in which the fine particles are arranged on the substrate surface;   removing the fine particles from the substrate; and   polishing the substrate surface to eliminate cavities formed in projecting portions of the substrate as a result of the etching;   forming a metal film on the surface of the polished substrate; and   peeling the metal film from the substrate.   
     
     
         20 . A manufacturing method for a magnetic recording medium comprising the steps of:
 forming cavities in a surface of a substrate having a projecting pattern and a first recessing pattern formed in the surface and at least the first recessing pattern filled with fine particles;   flattening the substrate while removing the fine particles from the substrate in which the cavities are formed;   forming a second recessing pattern in a substrate of a magnetic recording medium by using a stamper formed with the flattened substrate as a master; and   filling the second recessing pattern formed in the substrate of the magnetic recording medium with a magnetic material.