Method for preparing additive for chemical mechanical polishing slurry composition

Abstract

Disclosed is a method for preparing an additive solution which can be contained in a chemical mechanical polishing slurry composition used for a semiconductor manufacturing process. The method for preparing an additive solution for a chemical mechanical polishing slurry composition comprises the steps of: preparing an aqueous iron salt solution by admixing an iron salt and cooled water of 5° C. or less; and preparing an oxide containing silicon and iron by admixing and stirring a silicon salt and the aqueous iron salt solution for carrying out a reaction of the silicon salt and the aqueous iron salt solution.

1 . A method for preparing an additive solution for a chemical mechanical polishing slurry composition, comprising the steps of:
 preparing an aqueous iron salt solution by admixing an iron salt and cooled water of 5° C. or less; and   preparing an oxide containing silicon and iron as an additive by admixing and stirring a silicon salt and the aqueous iron salt solution for carrying out a reaction of the silicon salt and the aqueous iron salt solution.   
   
   
       2 . The method for preparing an additive solution for a chemical mechanical polishing slurry composition of  claim 1 , wherein the iron salt is selected from the group consisting of FeCl 3 , Fe(NO 3 ) 3 , Fe 2 (SO 4 ) 3 , Fe 2 (C 2 O 4 ) 3  and mixture thereof. 
   
   
       3 . The method for preparing an additive solution for a chemical mechanical polishing slurry composition of  claim 1 , wherein the silicon salt is SiCl 4 . 
   
   
       4 . The method for preparing an additive solution for a chemical mechanical polishing slurry composition of  claim 1 , wherein the concentration of the iron salt in the aqueous iron salt solution is 0.1 to 50.0 mol %. 
   
   
       5 . The method for preparing an additive solution for a chemical mechanical polishing slurry composition of  claim 1 , wherein the amount of Si contained in the silicon salt is 2 to 10 times of the amount of Fe contained in the iron salt by mole ratio. 
   
   
       6 . The method for preparing an additive solution for a chemical mechanical polishing slurry composition of  claim 1 , further comprising a step of removing ions contained in a reaction solution of the silicon salt and the aqueous iron salt solution. 
   
   
       7 . The method for preparing an additive solution for a chemical mechanical polishing slurry composition of  claim 6 , wherein the step of removing ions is carried out by dialyzing the reaction solution of the silicon salt and the aqueous iron salt solution with a membrane. 
   
   
       8 . The method for preparing an additive solution for a chemical mechanical polishing slurry composition of  claim 1 , wherein amount of the additive is 0.1 to 20 weight % with respect to the total additive solution. 
   
   
       9 . The method for preparing an additive solution for a chemical mechanical polishing slurry composition of  claim 1 , wherein a particle size of the additive is 3 to 10 nm.