US2009119818A1PendingUtilityA1
High definition litho applique and emblems
Est. expiryAug 11, 2028(~2 yrs left)· nominal 20-yr term from priority
Y10T29/4998D06Q 1/10Y10T428/2481D06Q 1/00D06P 5/004D06P 5/003D06Q 1/12
26
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Claims
Abstract
The invention provides high definition litho appliqué and emblems manufactured from appropriate fabric, such as 100% polyester twill or micro fiber material, which has been sublimated with a high definition photograph-quality print. The high definition litho appliqué and emblems are cut into the desired shape and optional affixed to a garment. The invention further provides processes for producing the same.
Claims
exact text as granted — not AI-modified1 . A method for manufacturing high definition litho appliqué comprising
(a) digitally printing a high resolution image onto transfer paper; (b) transferring the image to an appropriate fabric to obtain an imaged fabric; and (c) cutting out the image from the imaged fabric to obtain a high definition litho appliqué.
2 . The method of claim 1 , wherein step (a) further comprises printing a unique number into each appliqué applied of a specific design.
3 . A high definition litho appliqué produced by the method of claim 1 .
4 . A high definition litho appliqué produced by the method of claim 2 , wherein the high definition litho appliqué is a limited edition high definition litho appliqué.
5 . The method of claim 1 further comprising (d) attaching the high definition litho appliqué to a garment.
6 . The method of claim 5 , wherein step (d) comprises affixing the high definition litho appliqué with a complex stitching pattern.
7 . A garment produced by the method of claim 5 .
8 . The garment of claim 7 , further comprising a separate trademark or logo.
9 . A method for manufacturing a garment or hat with high definition litho emblem comprising
(a) digitally printing a high resolution image onto transfer paper; (b) transferring the image to an appropriate fabric to obtain an imaged fabric; (c) cutting out the image from the imaged fabric to obtain a cut out printed design; (d) cutting out a felt backing for the cut out printed design; and (e) applying the cut out printed design and felt backing to a garment or hat.
10 . The method of claim 9 , wherein step (e) comprises affixing the printed design and felt backing with a complex stitching pattern.
11 . A garment or hat produced by the method of claim 9 .
12 . A high definition litho appliqué or emblem manufactured from appropriate fabric which has been sublimated with a high definition photograph-quality print.
13 . A method for manufacturing high definition litho appliqué comprising
(a) digitally printing a high resolution image onto an appropriate fabric to obtain an imaged fabric; and (b) cutting out the image from the imaged fabric to obtain a high definition litho appliqué.
14 . The method of claim 13 further comprising (c) attaching the high definition litho appliqué to a garment.
15 . The method of claim 14 , wherein step (c) comprises affixing the high definition litho appliqué with a complex stitching pattern.Join the waitlist — get patent alerts
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