US2009119818A1PendingUtilityA1

High definition litho applique and emblems

Assignee: ACCOLADE GROUP INCPriority: Aug 11, 2008Filed: Oct 9, 2008Published: May 14, 2009
Est. expiryAug 11, 2028(~2 yrs left)· nominal 20-yr term from priority
Y10T29/4998D06Q 1/10Y10T428/2481D06Q 1/00D06P 5/004D06P 5/003D06Q 1/12
26
PatentIndex Score
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Claims

Abstract

The invention provides high definition litho appliqué and emblems manufactured from appropriate fabric, such as 100% polyester twill or micro fiber material, which has been sublimated with a high definition photograph-quality print. The high definition litho appliqué and emblems are cut into the desired shape and optional affixed to a garment. The invention further provides processes for producing the same.

Claims

exact text as granted — not AI-modified
1 . A method for manufacturing high definition litho appliqué comprising
 (a) digitally printing a high resolution image onto transfer paper;   (b) transferring the image to an appropriate fabric to obtain an imaged fabric; and   (c) cutting out the image from the imaged fabric to obtain a high definition litho appliqué.   
   
   
       2 . The method of  claim 1 , wherein step (a) further comprises printing a unique number into each appliqué applied of a specific design. 
   
   
       3 . A high definition litho appliqué produced by the method of  claim 1 . 
   
   
       4 . A high definition litho appliqué produced by the method of  claim 2 , wherein the high definition litho appliqué is a limited edition high definition litho appliqué. 
   
   
       5 . The method of  claim 1  further comprising (d) attaching the high definition litho appliqué to a garment. 
   
   
       6 . The method of  claim 5 , wherein step (d) comprises affixing the high definition litho appliqué with a complex stitching pattern. 
   
   
       7 . A garment produced by the method of  claim 5 . 
   
   
       8 . The garment of  claim 7 , further comprising a separate trademark or logo. 
   
   
       9 . A method for manufacturing a garment or hat with high definition litho emblem comprising
 (a) digitally printing a high resolution image onto transfer paper;   (b) transferring the image to an appropriate fabric to obtain an imaged fabric;   (c) cutting out the image from the imaged fabric to obtain a cut out printed design;   (d) cutting out a felt backing for the cut out printed design; and   (e) applying the cut out printed design and felt backing to a garment or hat.   
   
   
       10 . The method of  claim 9 , wherein step (e) comprises affixing the printed design and felt backing with a complex stitching pattern. 
   
   
       11 . A garment or hat produced by the method of  claim 9 . 
   
   
       12 . A high definition litho appliqué or emblem manufactured from appropriate fabric which has been sublimated with a high definition photograph-quality print. 
   
   
       13 . A method for manufacturing high definition litho appliqué comprising
 (a) digitally printing a high resolution image onto an appropriate fabric to obtain an imaged fabric; and   (b) cutting out the image from the imaged fabric to obtain a high definition litho appliqué.   
   
   
       14 . The method of  claim 13  further comprising (c) attaching the high definition litho appliqué to a garment. 
   
   
       15 . The method of  claim 14 , wherein step (c) comprises affixing the high definition litho appliqué with a complex stitching pattern.

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