Method for making a lithographic printing plate support

Abstract

A method for making a lithographic printing plate support is disclosed which comprises the steps of: (i) providing an aluminum support; (ii) graining said support in an electrolyte composition; and (iii) anodizing said grained support; wherein said electrolyte composition comprises an effective concentration of a benzoic acid derivative or a sulphonic acid derivative.

1 - 13 . (canceled) 
   
   
       14 . A method for making a lithographic printing plate support comprising the steps of:
 (i) providing an aluminum support;   (ii) graining said support in a graining electrolyte composition; and   (iii) anodizing said grained support;   wherein the electrolyte composition comprises an effective concentration of a benzoic acid derivative or a sulphonic acid derivative.   
   
   
       15 . The method according to  claim 14 , wherein the effective concentration of the benzoic acid derivative or the sulphonic acid derivative is between 0.0001 mol/l and 0.2 mol/l. 
   
   
       16 . The method according to  claim 15 , wherein the effective concentration of the benzoic acid derivative or the sulphonic acid derivative is between 0.001 mol/l and 0.05 mol/l. 
   
   
       17 . The method according to  claim 14 , wherein the benzoic acid derivative is selected from the group consisting of an optionally substituted benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, salicylic acid, benzoic anhydride, 1-naphthoic acid, 2-naphthoic acid, salts thereof and esters thereof. 
   
   
       18 . The method according to  claim 15 , wherein the benzoic acid derivative is selected from the group consisting of an optionally substituted benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, salicylic acid, benzoic anhydride, 1-naphthoic acid, 2-naphthoic acid, salts thereof and esters thereof. 
   
   
       19 . The method according to  claim 16 , wherein the benzoic acid derivative is selected from the group consisting of an optionally substituted benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, salicylic acid, benzoic anhydride, 1-naphthoic acid, 2-naphthoic acid, salts thereof and esters thereof. 
   
   
       20 . The method according to  claim 14 , wherein the sulphonic acid derivative is selected from the group consisting of an optionally substituted benzenesulphonic acid, benzenedisulphonic acid, pyridine sulphonic acid, naphthalene sulphonic acid, naphthalene disulphonic acid, alkyl sulphonic acid, alkylene sulphonic acid, quinoline sulphonic acid, salts thereof and esters thereof. 
   
   
       21 . The method according to  claim 15 , wherein the sulphonic acid derivative is selected from the group consisting of an optionally substituted benzenesulphonic acid, benzenedisulphonic acid, pyridine sulphonic acid, naphthalene sulphonic acid, naphthalene disulphonic acid, alkyl sulphonic acid, alkylene sulphonic acid, quinoline sulphonic acid, salts thereof and esters thereof. 
   
   
       22 . The method according to  claim 16 , wherein the sulphonic acid derivative is selected from the group consisting of an optionally substituted benzenesulphonic acid, benzenedisulphonic acid, pyridine sulphonic acid, naphthalene sulphonic acid, naphthalene disulphonic acid, alkyl sulphonic acid, alkylene sulphonic acid, quinoline sulphonic acid, salts thereof and esters thereof. 
   
   
       23 . The method according to  claim 14 , wherein the benzoic acid derivative is selected from the group consisting of an optionally substituted benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, salicylic acid, benzoic anhydride, 1-naphthoic acid, 2-naphthoic acid, salts thereof and esters thereof, and the sulphonic acid derivative is selected from the group consisting of an optionally substituted benzenesulphonic acid, benzenedisulphonic acid, pyridine sulphonic acid, naphthalene sulphonic acid, naphthalene disulphonic acid, alkyl sulphonic acid, alkylene sulphonic acid, quinoline sulphonic acid, salts thereof and esters thereof. 
   
   
       24 . The method for making a lithographic printing plate precursor comprising the steps of:
 (i) providing a support according to the method of  claim 14 ;   (ii) applying a coating comprising at least one heat- or light-sensitive imaging layer onto said support; and   (iii) drying the coating applied in step (ii) to provide the precursor.   
   
   
       25 . The method according to  claim 24 , wherein the effective concentration of the benzoic acid derivative or the sulphonic acid derivative is between 0.0001 mol/l and 0.2 mol/l. 
   
   
       26 . The method according to  claim 25 , wherein the effective concentration of the benzoic acid derivative or the sulphonic acid derivative is between 0.001 mol/l and 0.05 mol/l. 
   
   
       27 . The method according to  claim 24 , wherein the benzoic acid derivative is selected from the group consisting of an optionally substituted benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, salicylic acid, benzoic anhydride, 1-naphthoic acid, 2-naphthoic acid, salts thereof and esters thereof. 
   
   
       28 . The method according to  claim 25 , wherein the benzoic acid derivative is selected from the group consisting of an optionally substituted benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, salicylic acid, benzoic anhydride, 1-naphthoic acid, 2-naphthoic acid, salts thereof and esters thereof. 
   
   
       29 . The method according to  claim 24 , wherein the sulphonic acid derivative is selected from the group consisting of an optionally substituted benzenesulphonic acid, benzenedisulphonic acid, pyridine sulphonic acid, naphthalene sulphonic acid, naphthalene disulphonic acid, alkyl sulphonic acid, alkylene sulphonic acid, quinoline sulphonic acid, salts thereof and esters thereof. 
   
   
       30 . The method according to  claim 25 , wherein the sulphonic acid derivative is selected from the group consisting of an optionally substituted benzenesulphonic acid, benzenedisulphonic acid, pyridine sulphonic acid, naphthalene sulphonic acid, naphthalene disulphonic acid, alkyl sulphonic acid, alkylene sulphonic acid, quinoline sulphonic acid, salts thereof and esters thereof. 
   
   
       31 . The method according to  claim 24 , wherein the benzoic acid derivative is selected from the group consisting of an optionally substituted benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, salicylic acid, benzoic anhydride, 1-naphthoic acid, 2-naphthoic acid, salts thereof and esters thereof, and the sulphonic acid derivative is selected from the group consisting of an optionally substituted benzenesulphonic acid, benzenedisulphonic acid, pyridine sulphonic acid, naphthalene sulphonic acid, naphthalene disulphonic acid, alkyl sulphonic acid, alkylene sulphonic acid, quinoline sulphonic acid, salts thereof and esters thereof. 
   
   
       32 . The method according to  claim 24 , wherein the coating comprises an infrared absorbing agent and two heat-sensitive imaging layers:
 (i) a first layer comprising a heat-sensitive oleophilic resin, and   (ii) a second layer located between said first layer and the hydrophilic support, the second layer comprising a polymer comprising at least one monomeric unit that comprises at least one sulphonamide group.   
   
   
       33 . The method according to  claim 25 , wherein the coating comprises an infrared absorbing agent and two heat-sensitive imaging layers:
 (i) a first layer comprising a heat-sensitive oleophilic resin, and   (ii) a second layer located between said first layer and the hydrophilic support, the second layer comprising a polymer comprising at least one monomeric unit that comprises at least one sulphonamide group.   
   
   
       34 . The method according to  claim 27 , wherein the coating comprises an infrared absorbing agent and two heat-sensitive imaging layers:
 (i) a first layer comprising a heat-sensitive oleophilic resin, and   (ii) a second layer located between said first layer and the hydrophilic support, the second layer comprising a polymer comprising at least one monomeric unit that comprises at least one sulphonamide group.   
   
   
       35 . The method according to  claim 29 , wherein the coating comprises an infrared absorbing agent and two heat-sensitive imaging layers:
 (i) a first layer comprising a heat-sensitive oleophilic resin, and   (ii) a second layer located between said first layer and the hydrophilic support, the second layer comprising a polymer comprising at least one monomeric unit that comprises at least one sulphonamide group.   
   
   
       36 . The method according to  claim 32 , wherein the monomeric unit that comprises at least one sulfonamide group is represented by the following formula (I): 
     
       
         
         
             
             
         
       
       wherein: 
       R 1  represents hydrogen or a hydrocarbon group having up to 12 carbon atoms; 
       R 2  and R 3  independently represent hydrogen or a hydrocarbon group; 
       X 1  represents a single bond or divalent linking group; 
       Y 1  is a bivalent sulphonamide group represented by —NR j —SO 2 — or —SO 2 —NR k — wherein R j  and 
       R k  each independently represent hydrogen, an optionally substituted alkyl, alkanoyl, alkenyl, alkynyl, cycloalkyl, heterocyclic, aryl, heteroaryl, aralkyl or heteroaralkyl group or a group of the formula —C(═N)—NH—R 2 , wherein R 2  represents hydrogen or an optionally substituted alkyl or aryl group; and 
       Z 1  represents a terminal group or a bi-, tri- or quadrivalent linking group wherein the remaining 1 to 3 bonds of Z 1  are linked to Y 1 . 
     
   
   
       37 . The method according to  claim 32 , wherein the coating further comprises a development barrier layer above said first and second layer, the development barrier layer comprising a compound selected from the group consisting of:
 a water-repellent polymer or copolymer;   a bifunctional compound comprising a polar group and a hydrophobic group; and   a bifunctional block-copolymer comprising a polar block and a hydrophobic block.   
   
   
       38 . The method according to  claim 33 , wherein the coating further comprises a development barrier layer above said first and second layer, the development barrier layer comprising a compound selected from the group consisting of:
 a water-repellent polymer or copolymer;   a bifunctional compound comprising a polar group and a hydrophobic group; and   a bifunctional block-copolymer comprising a polar block and a hydrophobic block.   
   
   
       39 . The method according to  claim 37 , wherein the bifunctional block-copolymer comprises a poly- or oligo(alkylene oxide) block and a hydrophobic block. 
   
   
       40 . The method according to  claim 24 , wherein the heat-sensitive imaging layer comprises an infrared absorbing agent, hydrophobic thermoplastic polymer particles and a hydrophilic binder. 
   
   
       41 . The method according to  claim 31 , wherein the coating comprises an infrared absorbing agent and two heat-sensitive imaging layers:
 (i) a first layer comprising a heat-sensitive oleophilic resin, and   (ii) a second layer located between said first layer and the hydrophilic support, the second layer comprising a polymer comprising at least one monomeric unit that comprises at least one sulphonamide group.   
   
   
       42 . The method according to  claim 39 , wherein the bifunctional block-copolymer comprises at least one of a long chain hydrocarbon group, a poly- or oligosiloxane group or a perfluorinated hydrocarbon group. 
   
   
       43 . The method according to  claim 42 , wherein the bifunctional block-copolymer comprises at least two of a long chain hydrocarbon group, a poly- or oligosiloxane group or a perfluorinated hydrocarbon group. 
   
   
       44 . The method according to  claim 43 , wherein the bifunctional block-copolymer comprises a long chain hydrocarbon group, a poly- or oligosiloxane group and a perfluorinated hydrocarbon group.