Oled display encapsulation with the optical property

Abstract

A process of making an optical film or optical array comprises: a) simultaneously directing a series of gas flows along elongated substantially parallel channels to form a first thin film on a substrate; wherein the series of gas flows comprises, in order, at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material; wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material to form the first thin film; b) repeating step a) a plurality of times to produce a first thickness of a first film layer with a first optical property; wherein the process is carried out at or above atmospheric pressure; c) repeating steps a) and b) to produce a second film layer; and wherein the process is carried out substantially at or above atmospheric pressure.

1 . A process of making an optical film or optical array comprising:
 a) simultaneously directing a series of gas flows along elongated substantially parallel channels to form a first thin film on a substrate;
 wherein the series of gas flows comprises, in order, at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material; 
 wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material to form the first thin film; 
   b) repeating step a) a plurality of times to produce a first thickness of a first film layer with a first optical property;
 wherein the process is carried out at or above atmospheric pressure; 
   c) repeating steps a) and b) to produce a second film layer; and
 wherein the process is carried out substantially at or above atmospheric pressure. 
   
   
   
       2 . The process as in  claim 1  wherein the temperature of the substrate during deposition is under 250° C. 
   
   
       3 . The process as in  claim 1  wherein said second film layer has a second thickness. 
   
   
       4 . The process as in  claim 1  wherein a third reactive gas and a fourth reactive gas are used to form said second film layer. 
   
   
       5 . The process as in  claim 1  wherein said second film layer has a second optical property. 
   
   
       6 . The process as in  claim 1  wherein said first and second film layer encapsulates the substrate. 
   
   
       7 . The process as in  claim 1  wherein said substrate comprises an OLED device. 
   
   
       8 . The process as in  claim 1  wherein said substrate comprises a photovoltaic device. 
   
   
       9 . The process as in  claim 1  wherein said substrate comprises a sensor or a sensor array. 
   
   
       10 . The process as in  claim 1  wherein said first reactive gas comprises a mixture of gases. 
   
   
       11 . The process of  claim 1  wherein said first film layer is an interference filter. 
   
   
       12 . The process of  claim 1  wherein first film layer selectively reflects ambient ultraviolet light. 
   
   
       13 . A process of making an optical film or optical array comprising:
 a) simultaneously directing a series of gas flows along elongated, substantially parallel channels to form a first thin film on a substrate;
 wherein the series of gas flows comprises, in order, at least a first reactive gaseous mixture, an inert purge gas, and a second reactive gaseous mixture; 
 wherein the first reactive gaseous mixture is capable of reacting with a substrate surface treated with the second reactive gaseous mixture to form the first thin film; 
   b) repeating step a) with a third reactive gaseous mixture;   c) repeating steps a) and b) a plurality of times to produce a first thickness of a first film layer with a first optical property; and
 wherein the process is carried out at or above atmospheric pressure. 
   
   
   
       14 . The process of  claim 13  comprising:
 d) repeating steps a), b), and c) to produce a second film layer.   
   
   
       15 . The process of  claim 14  wherein a fourth reactive gaseous mixture is substituted for said third reactive gaseous mixture prior to step d). 
   
   
       16 . The process of  claim 15  wherein a fifth reactive gaseous mixture is substituted for said second reactive gaseous mixture prior to step d). 
   
   
       17 . The process of  claim 13  wherein said first gaseous mixture is comprised of first materials at a first concentration and said third gaseous mixture is comprised of said first materials at a second concentration. 
   
   
       18 . The process of  claim 13  wherein said first film layer is a gradient layer. 
   
   
       19 . The process of  18  wherein said first film layer is a Rugate filter. 
   
   
       20 . The process of  claim 13  wherein the first or second gaseous mixture is selected from a group comprising dialectic oxides.