Vacuum processing apparauts

Abstract

A vacuum processing apparatus having an improved wafer processing efficiency and an improved working efficiency is provided. The vacuum processing apparatus includes a vacuum container in which a specimen is processed with plasma generated from a processing gas supplied to the vacuum container; a transfer container through which the specimen processed in the vacuum container is transferred, the transfer container being coupled to the vacuum container under ambient pressure; a blower for generating an ambient gas flow in the transfer container and an outlet disposed on the transfer container; a storage container for storing the specimen processed in the vacuum container, the storage container being disposed in the ambient gas flow in the transfer container; and an exhauster for exhausting a gas in the storage container.

1 . A vacuum processing apparatus comprising;
 a vacuum container in which a specimen is processed in a predetermined vacuum pressure using a plasma generated from gas supplied to the vacuum container;   a transfer container on a front side of which a cassette stage being able to hold a cassette thereon is disposed and inside of which a transfer chamber for transferring the specimen under ambient pressure is disposed, the cassette being capable of storing the specimen inside thereof;   a load lock chamber, in which the specimen is placed, disposed between the vacuum container and the transfer container and coupled to these containers, the pressure in the load lock chamber being able to change between the vacuum pressure and the ambient pressure;   a blower for generating an ambient gas flow in the transfer chamber; and   an outlet for discharging the ambient gas in the transfer chamber out of the transfer container,   wherein the specimen is transferred in the transfer chamber on a path between the cassette and the load lock chamber, and further comprising:   a storage container which can store the specimen processed in the vacuum container and transferred in the transfer chamber on the way back to the cassette, the storage container being disposed in the ambient gas flow inside the transfer chamber; and   an exhauster for exhausting a gas in the storage container.   
   
   
       2 . A vacuum processing apparatus according to  claim 1 , further comprising a robot disposed in the transfer chamber for putting the specimen into and removing the specimen from the cassette disposed on the stage and transferring the specimen in the transfer chamber. 
   
   
       3 . A vacuum processing apparatus according to  claim 1 , wherein the storage container comprises:
 a surrounding external wall which constitutes a substantially closed storage space;   a first opening of the surrounding external wall which communicates with the storage space and the transfer chamber and through which the specimen is transferred between the storage space and the transfer chamber; and   a second opening which communicates with the exhauster and faces the storage space and through which the gas in the storage space is discharged.   
   
   
       4 . The vacuum processing apparatus according to  claim 1 , wherein an opening in the storage container faces the ambient gas flow. 
   
   
       5 . The vacuum processing apparatus according to  claim 1 , wherein internal pressure of the storage space is lower than internal pressure of the transfer chamber. 
   
   
       6 . The vacuum processing apparatus according to  claim 3 , wherein internal pressure of the storage space is lower than internal pressure of the transfer chamber. 
   
   
       7 . A vacuum processing apparatus according to  claim 2 , wherein the storage container comprises
 a surrounding external wall which constitutes a substantially closed storage space;   a first opening of the surrounding external wall which communicates with the storage space and the transfer chamber and through which the specimen is transferred between the storage space and the transfer chamber; and   a second opening which communicates with the exhauster and faces the storage space and through which the gas in the storage space is discharged.   
   
   
       8 . The vacuum processing apparatus according to  claim 7 , wherein internal pressure of the storage space is lower than internal pressure of the transfer chamber. 
   
   
       9 . The vacuum processing apparatus according to  claim 2 , wherein an opening in the storage container faces the ambient gas flow. 
   
   
       10 . The vacuum processing apparatus according to  claim 2 , wherein internal pressure of the storage space is lower than internal pressure of the transfer chamber.