US2009072409A1PendingUtilityA1

Interconnect Structures Incorporating Air-Gap Spacers

Assignee: IBMPriority: Sep 14, 2007Filed: Sep 14, 2007Published: Mar 19, 2009
Est. expirySep 14, 2027(~1.1 yrs left)· nominal 20-yr term from priority
H10P 50/283H10W 20/0765H10W 72/00H10W 20/495H10W 20/425H10W 20/096H10W 20/085H10W 20/081H10W 20/077H10W 20/076H10W 20/075H10W 20/074H10W 20/072H10W 20/056H10W 20/48H10W 20/47H10W 20/46H10W 20/42H10W 20/40H10W 20/033H10W 20/20H10W 20/084G01H 11/06G01H 11/00G01H 3/00G01H 11/02
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Claims

Abstract

A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.

Claims

exact text as granted — not AI-modified
1 . A dual damascene article of manufacture comprising a trench containing a conductive metal column the trench and the conductive metal column extending down into and contiguous with a via, the trench and the conductive metal column and the via having a common axis, wherein the trench further comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. 
   
   
       2 . The article of manufacture of  claim 1  comprising a capped dual damascene article of manufacture. 
   
   
       3 . The article of manufacture of  claim 1  wherein the dual damascene article of manufacture comprises a silicon compound ILD selected from a dense silica ILD, a porous silica ILD, a dense organosilicate ILD, or a porous organosilicate ILD 
   
   
       4 . A dual damascene article of manufacture comprising a trench containing a conductive metal column the trench and the conductive metal column extending down into and contiguous with a via, the trench and the conductive metal column and said via having a common axis, wherein said trench further comprises a sidewall air-gap immediately adjacent said side walls of said trench and said conductive metal column, said sidewall air-gap extending down to said via, wherein said width of said sidewall air-gap varies from about 1 Angstrom to about 1000 Angstroms, and said via does not have a sidewall air-gap. 
   
   
       5 . A capped dual damascene article of manufacture comprising a trench containing a conductive metal column said trench and said conductive metal column extending down into and contiguous with a via, said trench and said conductive metal column and said via having a common axis, wherein said trench further comprises a sidewall air-gap immediately adjacent said side walls of said trench and said conductive metal column, said sidewall air-gap extending down to said via, and further comprising a perforated pinched off cap operatively associated with said article, said perforated pinched off cap having seams in it. 
   
   
       6 . A capped dual damascene article of manufacture comprising a via and a trench containing a conductive metal column, said trench and said conductive metal column having a common axis, wherein said trench further comprises a sidewall air-gap immediately adjacent only to the side walls of said trench and said conductive metal column, and further comprising a perforated pinched off cap operatively associated with said article, said perforated pinched off cap having seams in it. 
   
   
       7 . The article of manufacture of any one of  claims 1  to  6  wherein the width of said air-gap can vary from about 1 angstrom to about the largest diameter of said trench. 
   
   
       8 . The article of manufacture of  claim 7  wherein said air-gap comprises an air gap no larger than about 0.5 microns 
   
   
       9 . The article of manufacture of one of  claims 1  or  5  wherein the depth of said air-gap varies from about 1 Angstrom below the trench to the entire depth of the via. 
   
   
       10 . The article of manufacture of one of  claims 4  or  6  wherein the depth of said air-gap varies from about 1 Angstrom below the top of said trench to the entire depth of said trench, with said air-gap still being formed adjacent; to said trench.

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