Exposure apparatus, light source apparatus and device fabrication

Abstract

An exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus includes a light source for generating a plasma, said light source including a condenser mirror that condenses a light irradiated from the plasma, an illumination optical system for illuminating the mask using the light condensed by the condenser mirror, a detector that is provided between the condenser mirror and the illumination optical system, said detector detecting a property of the light, and a changing part for changing a state of the plasma based on a detected result of the detector.

1 . A light source apparatus comprising:
 a generating part for generating a plasma;   a condenser mirror for condensing a light irradiated from the plasma;   a chamber for accommodating the generating part and the condenser mirror; and   a detector that is accommodated by the chamber, said detector detecting a property of the light on a condensing point of the light.   
     
     
         2 . A light source apparatus according to  claim 1 , wherein said property of the light is at least one of a position of the condensing point of the light, a light intensity distribution within a divergence angle divergent from the condensing point, a light intensity on the condensing point, and a spectrum of the light. 
     
     
         3 . A device fabrication method comprising the steps of:
 exposing an object using an exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus comprising:
 a light source for generating a plasma, said light source including a condenser mirror that condenses a light irradiated from the plasma; 
 an illumination optical system for illuminating the mask using the light condensed by the condenser mirror; 
 a detector that is provided between the condenser mirror and the illumination optical system, said detector detecting a property of the light; and 
 a changing part for changing a state of the plasma based on a detected result of the detector; and 
   performing a development process for the object exposed.