Corrosion-resistant member and process of producing the same

Abstract

A corrosion-resistant member comprising a base material having formed thereon a spayed coating having high corrosion resistance to corrosive gases or plasma, and a process of producing the same are disclosed. The corrosion-resistant member comprises a base material having formed thereon a sprayed coating, the sprayed coating being formed on the site of the base material to be exposed to corrosive gases or plasma and comprising Si, O, N, Group 2a element, and at least one element selected from the group consisting of Al, B, Zr and Ti, or comprises a base material having formed thereon a sprayed coating, the sprayed coating being formed on the site of the base material to be exposed to corrosive gases or plasma and comprising Si, O, N, Group 3a element, and at least one element selected from the group consisting of B, Zr and Ti.

1 . A vessel or part for a film-forming device or plasma treatment device which comprises a corrosion-resistant member comprising a base material having formed thereon a sprayed coating, wherein the sprayed coating comprises Si, O, N, Group 2a element, and Al, having a composition that Al:Si in ratio of the number of atoms are in a range of from 0.1:99.9 to 70:30, O:N in ratio of the number of atoms are in a range of from 99.9:0.1 to 60:40, and Al+Si: Group 2a element in ratio of the number of atoms are in a range of from 95:5 to 50:50. 
     
     
         2 . A vessel or part for a film-forming device or plasma treatment device which comprises a corrosion-resistant member comprising a base material having formed thereon a sprayed coating, wherein the sprayed coating comprises Si, O, N, Group 2a element, and B, having a composition that B:Si in ratio of the number of atoms are in a range of from 5:95 to 70:30, O:N in ratio of the number of atoms are in a range of from 99.9:0.1 to 60:40, and B+Si: Group 2a element in ratio of the number of atoms are in a range of from 85:15 to 40:60. 
     
     
         3 . A vessel or part for a film-forming device or plasma treatment device which comprises a corrosion-resistant member comprising a base material having formed thereon a sprayed coating, wherein the sprayed coating comprises Si, O, N, Group 2a element, and Zr, having a composition that Zr:Si in ratio of the number of atoms are in a range of from 5:95 to 70:30, O:N in ratio of the number of atoms are in a range of from 99.9:0.1 to 60:40, and Zr+Si: Group 2a element in ratio of the number of atoms are in a range of from 75:25 to 40:60. 
     
     
         4 . A vessel or part for a film-forming device or plasma treatment device which comprises a corrosion-resistant member comprising a base material having formed thereon a sprayed coating, wherein the sprayed coating comprises Si, O, N, Group 2a element, and Ti, having a composition that Ti:Si in ratio of the number of atoms are in a range of from 5:95 to 80:20, O:N in ratio of the number of atoms are in a range of from 99.9:0.1 to 60:40, and Ti+Si:Group 2a element in ratio of the number of atoms are in a range of from 85:15 to 40:60. 
     
     
         5 . A vessel or part for a film-forming device or plasma treatment device which comprises a corrosion-resistant member comprising a base material having formed thereon a sprayed coating, wherein the sprayed coating comprises Si, O, N, Group 3a element, and at least one element selected from the group consisting of B, Zr and Ti, having a concentration of the Group 3a element which is in a range of 10-78%, the concentration of Si which is in a range of 20-88%, the concentration of Zr and/or Ti which is in a range of 2-70%, and the concentration of nitrogen which is in a range of 0.01-15 wt %. 
     
     
         6 . The vessel or part for a film-forming device or plasma treatment device as claimed in  claim 1 , wherein the sprayed coating comprises a glass as the main component. 
     
     
         7 . The vessel or part for a film-forming device or plasma treatment device as claimed in  claim 5 , wherein the sprayed coating comprises a glass as the main component. 
     
     
         8 . The vessel or part for a film-forming device or plasma treatment device as claimed in  claim 2 , wherein the sprayed coating comprises a glass phase comprising Si, O, N, and Group 2a element, and a crystal phase comprising B. 
     
     
         9 . The vessel or part for a film-forming device or plasma treatment device as claimed in  claim 8 , wherein the crystal phase comprises boron nitride. 
     
     
         10 . A process of producing the corrosion-resistant member comprising spraying a raw material powder for spraying, to a base material with an atmospheric plasma spraying using an inert gas or a mixed gas of an inert gas and a reducing gas as a spraying gas, wherein a flow rate of the spraying gas is 50 SLM or higher, wherein the corrosion resistant member comprises a base material having found thereon a sprayed coating formed of the sprayed raw material powder, wherein the sprayed coating comprises Si, O, N, Group 2a element, and Al, having a composition that Al:Si in ratio of the number of atoms are in a range of from 0.1:99.9 to 70:30, O:N in ratio of the number of atoms are in a range of from 99.9:0.1 to 60:40, and Al+Si: Group 2a element in ratio of the number of atoms are in a range of from 95:5 to 50:50. 
     
     
         11 . A process of producing the corrosion-resistant member comprising spraying a raw material powder for spraying, to a base material with an atmospheric plasma spraying using an inert gas or a mixed gas of an inert gas and a reducing gas as a spraying gas, wherein a flow rate of the spraying gas is 50 SLM or higher, wherein the corrosion resistant member comprises a base material having found thereon a sprayed coating formed of the sprayed raw material powder, wherein the sprayed coating comprises Si, O, N, Group 3a element, and at least one element selected from the group consisting of B, Zr and Ti, having a concentration of the Group 3a element which is in a range of 10-78%, a concentration of Si which is in a range of 20-88%, a concentration of Zr and/or Ti which is in a range of 2-70%, and a concentration of nitrogen which is in a range of 0.01-15 wt %. 
     
     
         12 . A vessel or part for a film-forming device or plasma treatment device which comprises a corrosion-resistant member comprising a base material having formed thereon a sprayed coating, wherein the sprayed coating comprises Si, O, N, Group 3a element, and at least one element selected from the group consisting of B, Zr and Ti, having a composition that B:Si in ratio of the number of atoms are in a range of from 5:95 to 70:30, O:N in ratio of the number of atoms are in a range of from 99.9:0.1 to 60:40, and B+Si:Group 3a element in a ratio of the number of atoms are in a range of from 85:15 to 40:60. 
     
     
         13 . The vessel or part for a film-forming device or plasma treatment device as claimed in  claim 2  wherein the sprayed coating comprises a glass as the main component. 
     
     
         14 . The vessel or part for a film-forming device or plasma treatment device as claimed in  claim 3 , wherein the sprayed coating comprises a glass as the main component. 
     
     
         15 . The vessel or part for a film-forming device or plasma treatment device as claimed in  claim 4 , wherein the sprayed coating comprises a glass as the main component.