Methods and apparatuses for configuring radiation in microlithographic processing of workpieces

Abstract

Methods and apparatuses for configuring radiation used in microlithographic processing of workpieces are disclosed herein. One particular embodiment of such a method comprises directing a radiation beam along a radiation path from a reticle to an adjustment structure. The radiation beam has a wavefront with a first configuration in an image plane generally transverse to the radiation path. The method continues by changing at least one independently controllable parameter of the adjustment structure to change the wavefront of the radiation beam from the first configuration to a second configuration. After changing the shape of the wavefront from the first configuration to the second configuration, the method continues by impinging the radiation beam on the workpiece.

1 . A method for controlling characteristics of radiation in photolithographic processing of a microfeature workpiece, the method comprising:
 directing a radiation beam along a radiation path from a reticle to an adjustment structure, the radiation beam having a wavefront with a first configuration relative to an image plane generally transverse to the radiation path;   changing at least one independently controllable element of the adjustment structure from a first state to a second state to change the wavefront of the radiation beam from the first configuration to a second configuration different than the first configuration; and   impinging the radiation beam on the workpiece while the wavefront is in the second configuration.   
   
   
       2 . The method of  claim 1 , further comprising:
 determining a profile of at least a portion of the workpiece; and   based on the profile, changing at least one of the independently controllable elements of the adjustment structure from the first state to the second state to change the wavefront from the first configuration to the second configuration, wherein the second configuration corresponds at least in part to the profile of the workpiece.   
   
   
       3 . The method of  claim 1  wherein the adjustment structure includes a lens having a first portion and a second portion, the lens being operatively coupled to an actuator, and wherein:
 directing a radiation beam along a radiation path from a reticle to an adjustment structure includes impinging a first portion of the radiation beam on the first portion of the lens and impinging a second portion of the radiation beam on the second portion of the lens; and   changing at least one independently controllable element of the adjustment structure includes moving the first portion of the lens relative to and independently of the second portion of the lens.   
   
   
       4 . The method of  claim 1  wherein the adjustment structure includes a reflective medium having a first reflective surface coupled to a first actuator and a second reflective surface coupled to a second actuator, and wherein:
 directing a radiation beam along a radiation path from a reticle to an adjustment structure includes impinging a first portion of the radiation beam on the first reflective surface and impinging a second portion of the radiation beam on the second reflective surface; and   changing at least one independently controllable element of the adjustment structure includes moving the first reflective surface relative to and independently of the second reflective surface.   
   
   
       5 . The method of  claim 1  wherein the adjustment structure includes a selectively refractive and transmissive medium having a first portion and a second portion, and wherein:
 directing a radiation beam along a radiation path from a reticle to an adjustment structure includes impinging a first portion of the radiation beam on the first portion of the medium and impinging a second portion of the radiation beam on the second portion of the medium; and   changing at least one independently controllable element of the adjustment structure includes changing the refractive index and/or the extinction coefficient of the first portion of the medium relative to and independently of the refractive index and/or the extinction coefficient of the second portion of the medium.   
   
   
       6 . The method of  claim 1  wherein changing at least one independently controllable element of the adjustment structure from a first state to a second state includes applying an electrical signal to at least one element of the adjustment structure. 
   
   
       7 . The method of  claim 1 , further comprising tilting the workpiece relative to the image plane before impinging the radiation beam on the workpiece. 
   
   
       8 . The method of  claim 1 , further comprising passing the radiation beam through projection optics positioned between the adjustment structure and the workpiece. 
   
   
       9 . The method of  claim 1 , further comprising passing the radiation beam through projection optics positioned between the reticle and the adjustment structure before directing the radiation beam to the adjustment structure. 
   
   
       10 . The method of  claim 1 , further comprising directing the radiation beam from a radiation source along a radiation path and through illumination optics before directing the radiation beam from the reticle to the adjustment structure. 
   
   
       11 . The method of  claim 1 , further comprising moving at least one of the reticle and the workpiece relative to the other while impinging the radiation beam on the workpiece. 
   
   
       12 . The method of  claim 1 , further comprising scanning the reticle and the workpiece relative to each other by moving the reticle along a reticle path generally normal to the radiation path proximate to the reticle and moving the workpiece along a workpiece path in a direction opposite the reticle and generally normal to the radiation path. 
   
   
       13 . The method of  claim 1 , further comprising stepping the workpiece and the reticle relative to each other by impinging the radiation beam on a first field of the workpiece while the workpiece is in a first fixed transverse alignment relative to the reticle, moving at least one of the reticle and the workpiece transversely relative to the other to align a second field with the reticle, and exposing the second field to the radiation while the workpiece is in a second fixed transverse alignment relative to the reticle. 
   
   
       14 . A method for controlling characteristics of radiation in photolithographic processing of a microfeature workpiece, the method comprising:
 directing a radiation beam along a radiation path from a radiation source to a reticle;   directing the radiation beam along the radiation path from the reticle to an adjustment structure, the radiation beam having a wavefront with a first shape in an image plane generally transverse to the radiation path;   changing a state of at least one of a plurality of independently controllable elements of the adjustment structure from one state to another state to change the wavefront of the radiation beam from the first shape to a second shape different than the first shape, the second shape corresponding at least in part to a profile of the workpiece;   directing the radiation beam away from the adjustment structure along the radiation path; and   impinging the radiation beam directed away from the adjustment structure on the workpiece.   
   
   
       15 . The method of  claim 14 , further comprising determining a profile of at least a portion of the workpiece before changing the shape of the wavefront from the first shape to the second shape. 
   
   
       16 . The method of  claim 14  wherein the adjustment structure includes a lens having a first portion and a second portion, the lens being operatively coupled to an actuator, and wherein:
 directing the radiation beam along the radiation path from the reticle to an adjustment structure includes impinging a first portion of the radiation beam on the first portion of the lens and impinging a second portion of the radiation beam on the second portion of the lens; and   changing a state of at least one of a plurality of independently controllable elements of the adjustment structure includes moving the first portion of the lens relative to and independently of the second portion of the lens.   
   
   
       17 . The method of  claim 14  wherein the adjustment structure includes a reflective medium having a first reflective surface coupled to a first actuator and a second reflective surface coupled to a second actuator, and wherein:
 directing the radiation beam along the radiation path from the reticle to an adjustment structure includes impinging a first portion of the radiation beam on the first reflective surface and impinging a second portion of the radiation beam on the second reflective surface; and   changing a state of at least one of a plurality of independently controllable elements of the adjustment structure includes moving the first reflective surface relative to and independently of the second reflective surface.   
   
   
       18 . The method of  claim 14  wherein the adjustment structure includes a selectively refractive and transmissive medium having a first portion and a second portion, and wherein:
 directing the radiation beam along the radiation path from the reticle to an adjustment structure includes impinging a first portion of the radiation beam on the first portion of the medium and impinging a second portion of the radiation beam on the second portion of the medium; and   changing a state of at least one of a plurality of independently controllable elements of the adjustment structure includes changing the refractive index and/or the extinction coefficient of the first portion of the medium relative to and independently of the refractive index and/or the extinction coefficient of the second portion of the medium.   
   
   
       19 . The method of  claim 14  wherein changing a state of at least one of a plurality of independently controllable elements of the adjustment structure from one state to another state includes applying an electrical signal to at least one element of the adjustment structure. 
   
   
       20 . The method of  claim 14 , further comprising tilting the workpiece relative to the image plane before impinging the radiation beam on the workpiece. 
   
   
       21 - 56 . (canceled)