Apparatus and methods for conditioning a polishing pad

Abstract

Apparatus and methods for conditioning a polishing pad are provided. An apparatus includes a base, an arm adapted to support a conditioning disk; and a drive mechanism coupled between the arm and the conditioning disk, wherein the drive mechanism is adapted to directly rotate the conditioning disk relative to the arm. Numerous other aspects are disclosed.

1 . An apparatus for conditioning a polishing pad comprising:
 an arm adapted to support a conditioning disk; and   a drive mechanism coupled between the arm and the conditioning disk,   wherein the drive mechanism is adapted to directly rotate the conditioning disk relative to the arm.   
   
   
       2 . The apparatus of  claim 1  wherein a rotation frequency of the drive mechanism is approximately equal to a conditioning disk rotation frequency. 
   
   
       3 . The apparatus of  claim 1  wherein a rotation frequency of a portion of the drive mechanism is different from a rotation frequency of the conditioning disk. 
   
   
       4 . The apparatus of  claim 1  further comprising a base and a housed pivot, wherein the arm is coupled to the base via the housed pivot. 
   
   
       5 . The apparatus of  claim 4  wherein a sum of a weight of the arm and a weight of the drive mechanism is an aggregate weight. 
   
   
       6 . The apparatus of  claim 5  wherein a leverage ratio is increased when the aggregate weight is further from the pivot than a center of gravity of the arm. 
   
   
       7 . The apparatus of  claim 1  wherein a ratio of rotation of the drive mechanism and a rotation of the conditioning disk is approximately the same. 
   
   
       8 . The apparatus of claim of  claim 1  wherein the arm is adapted to press the conditioning disk against a polishing pad. 
   
   
       9 . The apparatus of  claim 8  further comprising an actuator, wherein the actuator is adapted to apply a force to the arm, wherein the force causes the arm to press the conditioning disk against the polishing pad. 
   
   
       10 . The apparatus of  claim 1  wherein the conditioning disk is adapted to rotate when pressed into a polishing pad. 
   
   
       11 . The apparatus of  claim 1  further comprising a gimbal, wherein the gimbal is adapted to couple the drive mechanism to the conditioning disk. 
   
   
       12 . The apparatus of  claim 11  wherein the gimbal is adapted to allow the conditioning disk to at least one of move or flex. 
   
   
       13 . The apparatus of  claim 1  wherein the drive mechanism is a motor. 
   
   
       14 . A method for conditioning a polishing pad comprising:
 providing a drive mechanism having a rotary motion; and   coupling the rotary motion directly to a conditioning disk such that the conditioning disk rotates.   
   
   
       15 . The method of  claim 14  further comprising:
 rotating the conditioning disk.   
   
   
       16 . The method of  claim 15  further comprising:
 contacting a polishing pad with the rotating conditioning disk.   
   
   
       17 . The method of  claim 16  wherein an arm is adapted to press the conditioning disk against the polishing pad. 
   
   
       18 . The method of  claim 16  further comprising:
 measuring a force applied to the polishing pad by the conditioning disk.   
   
   
       19 . The method of  claim 18  further comprising:
 adjusting the force applied to the polishing pad by the rotating conditioning disk.   
   
   
       20 . The method of  claim 16  further comprising:
 tilting the rotating conditioning disk to provide a uniform polishing pad pressure.