US2009036035A1PendingUtilityA1
Apparatus and methods for conditioning a polishing pad
Est. expiryMar 13, 2026(expired)· nominal 20-yr term from priority
B24B 53/017B24B 53/005B24B 53/12
55
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Claims
Abstract
Apparatus and methods for conditioning a polishing pad include a base, an arm pivotally coupled to the base and adapted to support a conditioning disk, and an actuator coupled to the base and the arm. The actuator is adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force. A first force is produced with the actuator. The first force is scaled by a linearly variable amount to a second force that is applied to the polishing pad by a conditioning disk. Numerous other aspects are disclosed.
Claims
exact text as granted — not AI-modified1 . An apparatus for conditioning a polishing pad comprising:
a base; an arm pivotally coupled to the base and adapted to support a conditioning disk; and an actuator coupled to the base and the arm, and adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force.
2 . The apparatus of claim 1 , wherein the actuator includes a sealed pneumatic cylinder coupled to a rod.
3 . The apparatus of claim 1 , wherein the conditioning disk is coupled to the arm further from the pivot than the actuator is coupled to the arm.
4 . The apparatus of claim 3 , wherein a ratio of a distance of the conditioning disk to the pivot along the arm and a distance of the actuator to the pivot along the arm is at least approximately 10:1.
5 . The apparatus of claim 1 , further comprising a force transducer coupled to the arm and the actuator and situated between the arm and the actuator, and adapted to measure a force applied to the arm by the actuator.
6 . The apparatus of claim 1 , further comprising a further actuator coupled to the base and the arm, and adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force.
7 . A method for conditioning a polishing pad comprising:
producing a first force with an actuator; scaling the first force by a linearly variable amount to a second force that is applied to a polishing pad by a conditioning disk.
8 . The method of claim 7 further comprising:
pressing the conditioning disk into the polishing pad.
9 . The method of claim 7 further comprising:
providing a signal indicative of the first force produced by the actuator to a controller; and adjusting the first force based on the signal.
10 . The method of claim 7 further comprising:
tilting the conditioning disk when a non-uniform pressure is applied to a surface of the conditioning disk.
11 . A method for conditioning a polishing pad comprising:
providing a drive mechanism having a rotary motion; and transmitting the rotary motion to a conditioning disk via a flexible coupling that allows the conditioning disk to tilt while rotating the conditioning disk.
12 . An apparatus for conditioning a polishing pad comprising:
an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk.
13 . The apparatus of claim 12 , wherein the flexible coupling includes a disk.
14 . The apparatus of claim 13 , wherein the disk is one piece.
15 . The apparatus of claim 13 , wherein the disk is plastic.
16 . The apparatus of claim 13 , wherein the drive mechanism is coupled to a center portion of the disk.
17 . The apparatus of claim 13 , wherein the conditioning disk is coupled to an outer portion of the disk.
18 . The apparatus of claim 13 , wherein the drive mechanism is coupled to an outer portion of the disk.
19 . The apparatus of claim 13 , wherein the conditioning disk is coupled to a center portion of the disk.
20 . The apparatus of claim 12 , wherein the flexible coupling includes a shaft.Join the waitlist — get patent alerts
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