Illumination systems, exposure apparatus, and microdevice-manufacturing methods using same

Abstract

Illumination systems are disclosed that illuminate a surface M for irradiation with illumination light emitted from a light source 5 . An exemplary illumination system includes an incidence-side reflection-type fly-eye optical system 12 having multiple reflection-type partial optical systems arranged in rows, an emission-side reflection-type fly-eye optical system 14 having multiple reflection-type partial optical systems arranged in rows and corresponding to respective reflection-type partial optical systems of the incidence-side reflection-type fly-eye optical system 12 , and a condensing optical system including two reflecting mirrors 18, 20 that guide illumination light, reflected by the emission-side reflection-type fly-eye optical system 14 , to the surface M. The center of curvature of at least one of the reflecting mirrors is optically eccentric with respect to a normal to the surface for irradiation at the center of the illuminated region.

1 .- 15 . (canceled) 
   
   
       16 . A reflection-type illumination optical system for providing illumination light to a projection optical system via an arcuate-shape region on an illuminated surface, the illumination optical system comprising:
 a first fly's eye optical system arranged in an illumination optical path and including a plurality of first mirror elements arranged in parallel;   a second fly's eye optical system, arranged in an illumination optical path between the first fly's eye optical system and the illuminated surface, including a plurality of second mirror elements arranged in parallel and including a periphery, wherein each of the second mirror elements is associated with one of the first mirror elements; and   a reflection-type condenser optical system arranged in an optical path between the second fly's eye optical system and the illuminated surface, the reflection-type condenser optical system guiding a beam of illumination light from the second fly's eye optical system to the illuminated surface;   wherein an optical axis of the projection optical system is located outside the periphery of the second fly's eye optical system.   
   
   
       17 . The system of  claim 16 , wherein the reflection-type condenser optical system includes two reflection surfaces. 
   
   
       18 . The system of  claim 17 , wherein the two reflection surfaces are each respective curved surfaces. 
   
   
       19 . The system of  claim 18 , wherein each respective curved surface is a respective spherical curved surface. 
   
   
       20 . The system of  claim 18 , wherein each respective curved surface is a respective aspherical curved surface. 
   
   
       21 . The system of  claim 18 , wherein the respective curved surfaces comprise a spherical curved surface and an aspherical curved surface, respectively. 
   
   
       22 . The system of  claim 18 , wherein the reflection-type condenser optical system is configured such that light from each of the plurality of second mirror elements illuminates the illuminated surface in a superimposed manner. 
   
   
       23 . The system of  claim 22 , wherein the two reflection curved surfaces of the reflection-type condenser optical system include a concave surface and a convex surface, respectively. 
   
   
       24 . The system of  claim 17 , wherein:
 the two reflection surfaces have respective centers of curvature; and   the reflection-type condenser optical system has an optical axis that passes through the centers of curvature of the two reflection surfaces but is not parallel to a normal to a region of the illumination surface at the center of the region.   
   
   
       25 . The system of  claim 24 , wherein the two reflection curved surfaces are respective curved surfaces. 
   
   
       26 . The system of  claim 25 , wherein the two reflection curved surfaces are respective spherically curved surfaces. 
   
   
       27 . The system of  claim 25 , wherein the two reflection curved surfaces are respective aspherically curved surfaces. 
   
   
       28 . The system of  claim 23 , wherein the two reflection curved surfaces are a spherical surface and an aspherical surface, respectively. 
   
   
       29 . The system of  claim 24 , wherein the reflection-type condenser optical system is configured such that light from each of the plurality of second mirror elements illuminates the illuminated surface in a superimposed manner. 
   
   
       30 . An illumination-optical apparatus, comprising:
 a light source that supplies an illumination light having a wavelength of 5 nm to 50 nm; and   an illumination optical system as recited in  claim 16  that guides the illumination light from the light source to the an illuminated surface.   
   
   
       31 . An exposure apparatus that exposes a pattern, arranged on an illuminated surface, onto a photosensitive substrate, the exposure apparatus comprising an illumination optical system as recited in  claim 16 . 
   
   
       32 . A method for manufacturing a micro-device, comprising:
 exposing a pattern onto a photosensitive substrate using an exposure apparatus as recited in  claim 31 ;   developing the photosensitive substrate, onto which the pattern has been transferred;   forming on a surface of the photosensitive substrate a mask layer shaped in correspondence with the pattern; and   processing the surface of the photosensitive substrate through the mask layer.   
   
   
       33 . An exposure apparatus for exposing a pattern, arranged on an illuminated surface, onto a photosensitive substrate, the exposure apparatus comprising the illumination optical system recited in  claim 24 . 
   
   
       34 . A device-manufacturing method, comprising:
 exposing a pattern onto a photosensitive substrate using an exposure apparatus as recited in  claim 33 ;   developing the photosensitive substrate onto which the pattern has been transferred, and forming a mask layer on a surface of the photosensitive substrate, the mask layer being shaped in correspondence with the pattern; and   processing the surface of the photosensitive substrate through the mask layer.