Microchannel structure body

Abstract

A fine channel device, having an inlet opening for introducing a gas and an inlet path interconnecting with this inlet opening, a fine channel interconnecting with the inlet path, a discharge path interconnecting with the fine channel, and a discharge opening interconnecting with this discharge path. The inner diameter of the inlet path is greater than that of the fine channel, and either increases gradually, or remains identical, with increasing distance from the position where the inlet opening and the inlet path are in interconnection with each other.

1 . A gas treatment apparatus which includes a fine channel device, a member which introduces a gas into the fine channel device and a member which conducts a gas treatment with at least one of heat, a catalyst and plasma; wherein the fine channel device comprising:
 at least one inlet opening for introducing a gas,   at least one inlet path interconnecting with the inlet opening,   at least one fine channel, which interconnects with the inlet path and distributes and feeds the gas equally,   a discharge path which interconnects with the fine channel and discharges the gas, and   at least one discharge opening interconnecting with the discharge path;   wherein an inner diameter of the inlet path is greater than an internal diameter of the fine channel, and the inner diameter of the inlet path remains identical with increasing distance from a position where the inlet opening and the inlet path interconnect with each other; and   the fine channel device contains n fine channels, from a fine channel Y 1  positioned closest to the inlet opening through to a fine channel Y n  positioned farthest from the inlet opening, each of which interconnects with the inlet path; and   a 2  to a n , which are lengths along the inlet path between the interconnection positions, are all equal, when the position at which the inlet opening interconnects with the inlet path is labeled X 0 , the position at which the fine channel Y 1  interconnects with the inlet path is labeled X 1 , the length along the inlet path between the interconnection positions X 0  and X 1  is labeled a 1 , and thereafter each interconnection position, fine channel, and distance between fine channels is labeled in sequence, so that the position at which the fine channel Y n  farthest from the inlet opening interconnects with the inlet path is labeled X n , a fine channel that is one position closer to the inlet opening than the fine channel Y n  is labeled Y n-1 , the position at which the fine channel Y n-1  interconnects with the inlet path is labeled X n-1 , and the length along the inlet path between the interconnection positions X n-1  and X n  is labeled a n .   
     
     
         2 . A gas treatment apparatus according to  claim 1 , wherein the fine channel device comprises a heating device provided outside the fine channel device for heating a gas introduced into the fine channel. 
     
     
         3 . A gas treatment apparatus according to  claim 1 , wherein the fine channel device and the conduit piping are formed from synthetic quartz glass. 
     
     
         4 . A gas treatment apparatus according to  claim 1 , wherein a metal is disposed on all, or at least a portion of, walls of the fine channel, and further comprising at least one current generation device for causing current to flow through the metal. 
     
     
         5 . A gas treatment apparatus according to  claim 1 , wherein a metal is disposed on one or more walls of the fine channel, and further comprising at least one current generation device for causing current to flow through the metal. 
     
     
         6 . A gas treatment apparatus according to  claim 1 , further comprising at least one heating device provided outside the fine channel device for heating a gas introduced into the fine channel. 
     
     
         7 . A gas treatment apparatus according to  claim 1 , wherein the gas is at least one of nitric oxide and ammonia. 
     
     
         8 . A gas treatment apparatus according to  claim 1 , wherein the catalyst is a metal or a compound that comprises a metal. 
     
     
         9 . A gas treatment apparatus according to  claim 1 , further comprising at least one energy generation device for providing energy to the catalyst.