US2009018032A1PendingUtilityA1
Method of treating surface of substrate used in biological reaction system
Assignee: SAMSUNG ELECTRONICS CO LTDPriority: Jan 28, 2003Filed: Sep 25, 2008Published: Jan 15, 2009
Est. expiryJan 28, 2023(expired)· nominal 20-yr term from priority
B05D 1/62C03C 17/30B01L 2300/163B05D 2203/35B01L 3/508B01L 7/52C12Q 1/68
67
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
Provided is a method of treating a surface of a substrate used in a biochemical reaction system, the method including forming a polymer film on the surface by vapor deposition of a compound of formula (1) below and a compound of formula (2) below: (RO) 3 —Si—(CH 2 ) n1 —X (1) (RO) 3 —Si—(CH 2 ) n2 —(CF 2 ) m —X (2) wherein R is one of a methyl group and an ethyl group, X is one of a methyl group and a trifluoromethyl group, n1 is an integer from 1 to 3, n2 is an integer from 1 to 10, and m is an integer from 1 to 10.
Claims
exact text as granted — not AI-modified1 . A biochemical reaction system, comprising:
a substrate including a polymer film on a surface of the substrate, the polymer film being formed on the surface by vapor deposition of a compound of formula (1) below and a compound of formula (2) below:
(RO) 3 —Si—(CH 2 ) n1 —X (1)
(RO) 3 —Si—(CH 2 ) n2 —(CF 2 ) m —X (2)
wherein R is one of a methyl group and an ethyl group, X is one of a methyl group and a trifluoromethyl group, n1 is an integer from 1 to 3, n2 is an integer from 1 to 10, and m is an integer from 1 to 10.
2 . The biochemical reaction system of claim 1 being a polymerase chain reaction (PCR) system.
3 . The biochemical reaction system of claim 1 , wherein the compound of said formula (1) and the compound of said formula (2) are simultaneously deposited by vaporization.
4 . The biochemical reaction system of claim 1 , wherein the compound of said formula (1) and the compound of said formula (2) are sequentially deposited by vaporization.
6 . A composition for treating a surface of a substrate used in a biochemical reaction system, the composition comprising a compound of formula (1) below and a compound of formula (2) below:
(RO) 3 —Si—(CH 2 ) n1 —X (1) (RO) 3 —Si—(CH 2 ) n2 —(CF 2 ) m —X (2) wherein R is one of a methyl group and an ethyl group, X is one of a methyl group and a trifluoromethyl group, n1 is an integer from 1 to 3, n2 is an integer from 1 to 10, and m is an integer from 1 to 10.Join the waitlist — get patent alerts
Track US2009018032A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.