US2009002660A1PendingUtilityA1
Exposure apparatus and device manufacturing method
Est. expiryJul 9, 2023(expired)· nominal 20-yr term from priority
Inventors:Tohru Kiuchi
G03F 7/70341G02B 7/021G03F 7/70825G03F 7/2041G03F 7/709G02B 7/023
55
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Claims
Abstract
An exposure apparatus projects a pattern image onto a substrate via a projection optical system and a liquid, and the projection optical system has an optical member that comes into contact with the liquid and an optical group arranged between the optical member and a reticle. A holding mechanism that holds the optical member and the optical group holds the optical member so that it is movable relative to the optical group.
Claims
exact text as granted — not AI-modified1 . An exposure apparatus comprising: a projection optical system that includes an optical member that comes into contact with a liquid and an optical group arranged between said optical member and a pattern and that projects an image of said pattern onto a substrate via said liquid, and a holding mechanism that holds said optical member and said optical group, wherein said holding mechanism holds said optical member so as to be movable relative to said optical group.
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