Microlithographic projection exposure apparatus

Abstract

A microlithographic projection exposure apparatus contains an illumination system ( 12 ) for generating projection light ( 13 ) and a projection lens ( 20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120 ) with which a reticle ( 24 ) that is capable of being arranged in an object plane ( 22 ) of the projection lens can be imaged onto a light-sensitive layer ( 26 ) that is capable of being arranged in an image plane ( 28 ) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L 5 ; L 205 ; L 605 ; L 705 ; L 805 ; L 905 ; L 1005 ; L 1105 ) of the projection lens on the image side is immersed in an immersion liquid ( 34; 334 a; 434 a; 534 a ). A terminating element ( 44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144 ) that is transparent in respect of the projection light ( 13 ) is fastened between the final lens element on the image side and the light-sensitive layer.

1 .- 67 . (canceled) 
   
   
       68 . An exposure apparatus that exposes a substrate through an immersion region, comprising: an optical element that has a concave surface from which exposure light emerges; and a surface that is provided to surround an optical path of the exposure light, an interface of a liquid of the immersion region being held between the surface and an object, the object being disposed at a position where the object can be irradiated by the exposure light. 
   
   
       69 . An exposure apparatus according to  claim 68 , further comprising: an adjustment apparatus that adjusts a density of the liquid that is supplied between the concave surface and the object. 
   
   
       70 . An exposure apparatus according to  claim 68 , wherein the object includes the substrate. 
   
   
       71 . An exposure apparatus according to  claim 68 , wherein the surface is part of a holding member that holds the optical element. 
   
   
       72 . An exposure apparatus according to  claim 68 , wherein the surface is part of the optical element. 
   
   
       73 . An exposure apparatus according to  claim 68 , wherein a refractive index of the liquid with respect to the exposure light is higher than that of the optical element with respect to the exposure light. 
   
   
       74 . An exposure apparatus according to  claim 68 , further comprising: a projection optical system that projects a pattern image onto the substrate; wherein, the optical element that has the concave surface is an element of a plurality of optical elements of the projection optical system that is closest to an image plane of the projection optical system. 
   
   
       75 . An exposure method, comprising:
 forming an immersion region so that a space between an object and a concave surface of an optical element is filled with a liquid, an interface of the liquid being positioned between the object and a surface, the surface being provided to surround the optical path of exposure light; and exposing a substrate through the immersion region.   
   
   
       76 . An exposure method according to  claim 75 , wherein the object includes the substrate. 
   
   
       77 . A device fabricating method, wherein an exposure method according to  claim 75  is used. 
   
   
       78 . An exposure apparatus that exposes a substrate by radiating exposure light onto the substrate, comprising:
 an optical element that has a concave surface part from which the exposure light emerges; a lower surface that is provided to surround the concave surface part; and a side surface that is provided on the outer side of the lower surface with respect to the optical axis of the optical element and that faces the optical axis.   
   
   
       79 . An exposure apparatus according to  claim 78 , further comprising: a support member that supports the optical element; wherein, the lower surface is formed in the optical element or the support member.