Positive resist composition and method of pattern formation with the same

Abstract

A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

1 - 21 . (canceled) 
   
   
       22 . A resin having structures represented by formulae (CI) to (CIII): 
     
       
         
         
             
             
         
       
       wherein X represents a hydrogen atom, a halogen atom or an alkyl group; 
       Rf represents an alkyl group having a fluorine atom, a cycloalkyl group having a fluorine atom or an aryl group having a fluorine atom; 
       Y represents an alkylene group, a di-valent connecting group having an alicyclic hydrocarbon structure, a single bond, an ether group, an ester group, a carbonyl group, a carboxyl group or a di-valent group obtained by these groups; 
       V represents a group having a lactone ring; 
       Rc represents an unsubstituted hydrocarbon group, provided that Rc does not contain a hetero-atom; and 
       m, n and p each represents a numeral satisfying following relationships: 
       m+n+p=100, 0<m<100, 0<n<100 and 0≦p<100. 
     
   
   
       23 . A resin having structures represented by formulae (CI), (CIV) and (CIII): 
     
       
         
         
             
             
         
       
       wherein X represents a hydrogen atom, a halogen atom or an alkyl group; 
       Rf represents an alkyl group having a fluorine atom, a cycloalkyl group having a fluorine atom or an aryl group having a fluorine atom; 
       Y represents an alkylene group, a di-valent connecting group having an alicyclic hydrocarbon structure, a single bond, an ether group, an ester group, a carbonyl group, a carboxyl group or a di-valent group obtained by these groups; 
       Rp 1  represents a group which decomposes by an action of an acid; 
       Rc represents an unsubstituted hydrocarbon group, provided that Rc does not contain a hetero-atom; and 
       m, n and p each represents a numeral satisfying following relationships: 
       m+n+p=100, 0<m<100, 0<n<100 and 0≦p<100.