STABILIZATION OF Ni MONOSILICIDE THIN FILMS IN CMOS DEVICES USING IMPLANTATION OF IONS BEFORE SILICIDATION

Abstract

A method for forming a stabilized metal silicide film, e.g., contact (source/drain or gate), that does not substantially agglomerate during subsequent thermal treatments, is provided. In the present invention, ions that are capable of attaching to defects within the Si-containing layer are implanted into the Si-containing layer prior to formation of metal silicide. The implanted ions stabilize the film, because the implants were found to substantially prevent agglomeration or at least delay agglomeration to much higher temperatures than in cases in which no implants were used.

1 . A method for forming a stabilized NiSi film comprising:
 implanting F ions into a surface of a Si-containing layer at an implant energy of about 2 keV or less;   forming a Ni layer atop the surface of the Si-containing layer containing said F ions; and   siliciding the Ni layer and the Si-containing layer containing said F ions to form a NiSi film, said NiSi film exhibits little or no agglomeration during subsequent thermal processing.   
   
   
       2 . The method of  claim 1  wherein the Si-containing layer is a Si-containing substrate that comprises at least one gate region located on a surface of said substrate. 
   
   
       3 . The method of  claim 1  wherein the F ions are implanted at an energy from about 0.1 to about 5 keV using a dose from about 5E13 to about 5E16 atoms/cm 2 . 
   
   
       4 . The method of  claim 1  further comprising annealing the ions prior to said forming the metal layer, said annealing is performed in an inert gas ambient at a temperature from about 200° C. to about 1200° C. 
   
   
       5 . The method of  claim 1  further comprising forming a cap atop the metal layer prior to the siliciding. 
   
   
       6 . The method of  claim 1  wherein the siliciding comprises a first anneal and removal of unreacted metal. 
   
   
       7 . The method of  claim 6  wherein the first anneal is performed at a temperature from about 200° C. to about 700° C. 
   
   
       8 . The method of  claim 6  wherein the removal comprises a selective etch process. 
   
   
       9 . The method of  claim 6  further comprising a second anneal after said removal, said second anneal is performed at a temperature that is higher than the first anneal, wherein said higher temperature ranges from about 250° C. to about 950° C. 
   
   
       10 . The method of  claim 6  wherein said implanting F ions is performed after standard device ion implantation and activation annealing. 
   
   
       11 . A method of forming a stabilized metal silicide film comprising:
 implanting ions into a surface of a Si-containing layer during implanting source/drain regions, said ions are capable of attaching to defects within the Si-containing layer and said ions are selected from the group consisting of Si, H, Ct, Br, Pt, Re, Pd, Rh, W and In;   forming a metal layer atop the surface of the Si-containing layer containing said ions; and   siliciding the metal layer and the Si-containing layer containing said ions to form a metal silicide film, said metal silicide film exhibits little or no agglomeration during subsequent thermal processing.