US2008257749A1PendingUtilityA1
Method For Improving The Performance of Nickel Electrodes
Est. expiryJan 24, 2027(~0.5 yrs left)· nominal 20-yr term from priority
C25D 3/567C25B 11/075C25B 15/08C25B 11/051C25D 3/50C25B 1/46C25D 5/18C25D 21/18C25D 21/14
60
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
The invention relates to a method for improving the performance of nickel electrodes in alkali chloride electrolysis by adding water-soluble platinum compounds to the catolyte.
Claims
exact text as granted — not AI-modified1 . A method for improving the performance of nickel electrodes that are used in a membrane sodium chloride electrolytic process comprising:
(a) preparing a water-soluble or alkali-soluble platinum solution comprising:
(i) a solvent and
(ii) a soluble platinum compound
and (b) adding the solution to the catolyte
and thereby forming a coating on the nickel electrode.
2 . The method according to claim 1 , wherein the platinum compound is a water-soluble salt or a complex acid.
3 . The method according to claim 1 , wherein the platinum solution is hexachloroplatinic acid, or an alkali platinate, or a mixture thereof.
4 . The method according to claim 1 , wherein the soluble platinum compound is Na 2 PtCl 6 , or Na 2 Pt(OH) 6 , or a mixture thereof.
5 . The method according to claim 1 , wherein, after the addition of the platinum solution, the electrolytic voltage is varied in the range from 0V to 5V.
6 . The method according to claim 4 , wherein, after the addition of the platinum solution, the electrolytic voltage is varied in the range from 0V to 5V.
7 . The method according to claim 5 , wherein, after the addition of the platinum solution, the difference in the electrolytic voltage is from 0.5 to 500 mV.
8 . The method according to claim 6 , wherein, after the addition of the platinum solution, the difference in the electrolytic voltage is from 0.5 to 500 mV.
9 . The method according to claim 5 , wherein the voltage is varied by pulsing the voltage or by superimposing an alternating voltage on the electrolytic voltage, in the range from 0 to 5 V, and by a difference of from 0.5 to 500 mV.
10 . The method according to claim 8 , wherein the voltage is varied by pulsing the voltage or by superimposing an alternating voltage on the electrolytic voltage, in the range from 0 to 5 V, and by a difference of from 0.5 to 500 mV.
11 . The method according to claim 10 , which further comprises at least one additional water-soluble compound from Group VIII of the Periodic Table are added to the platinum solution.
12 . The method according to claim 1 , which further comprises at least one additional water-soluble compound from selected from the group consisting of palladium, iridium, platinum, rhodium, osmium and ruthenium.
13 . The method according to claim 11 , wherein, the additional water-soluble compound, based on the amount of platinum in the platinum compound, are present in a concentration of 1 wt. % to 50 wt. %.
14 . The method according to claim 12 , wherein, the additional water-soluble compound, based on the amount of platinum in the platinum compound, are present in a concentration of 1 wt. % to 50 wt. %.
15 . The method according to claim 1 , wherein the water soluble or alkali soluble platinum compound solution is metered at a rate of 0.001 g Pt/(h*m 2 ) to 1 g Pt/(h*m 2 ).
16 . The method according to claim 14 , wherein the water soluble or alkali soluble platinum compound solution is metered at a rate of 0.001 g Pt/(h*m 2 ) to 1 g Pt/(h*m 2 ).
17 . The method according to claim 15 , wherein the temperature at which the metering of the platinum solution is from 70° C. to 90° C.
18 . The method according to claim 16 , wherein the temperature at which the metering of the platinum solution is from 70° C. to 90° C.
19 . The method according to claim 15 , wherein the metering of the platinum solution occurs during electrolysis and under a current density between 0.1 to 10 kA/m 2 .
20 . The method according to claim 18 , wherein the metering of the platinum solution occurs during electrolysis and under a current density between 0.1 to 10 kA/m 2 .Join the waitlist — get patent alerts
Track US2008257749A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.