Apparatus for polarization-specific examination, optical imaging system, and calibration method

Abstract

A device for polarization-specific examination of an optical system having a detector part that has polarization detector means for recording the exit state of polarization of radiation emerging from the optical system. Also, an associated optical imaging system, and a calibration method for the device. The device includes a polarization detector with a polarizing grating structure. Provided as an alternative is a device for snapshot polarimetry having a birefringent element and downstream polarizer element that adequately polarizes nonquasi-parallel radiation. The device may be used for determining the influence on the state of polarization of UV radiation by a microlithographic projection objective.

1 . A device for conducting a pupil-resolved measurement of a state of polarization of optical radiation;
 wherein the device measures the state of the polarization after the optical radiation passes through a projection objective; and   all parts of the device are stationary during the pupil-resolved measurement of the state of the polarization.   
   
   
       2 . The device as claimed in  claim 1 , wherein the device conducts the pupil-resolved measurement over an entire pupil of the projection objective. 
   
   
       3 . The device as claimed in  claim 1 , wherein the projection objective is a high-aperture projection objective. 
   
   
       4 . The device as claimed in  claim 1 , further comprising a detector,
 wherein the detector comprises a birefringent element which varies a retardation of the optical radiation emerging from the projection objective as a function of beam angle.   
   
   
       5 . The device as claimed in  claim 1 , wherein the pupil-resolved measurements are pupil-resolved polarimetry measurements. 
   
   
       6 . The device as claimed in  claim 1 , wherein a wavelength of the optical radiation is not greater than approximately 200 nm. 
   
   
       7 . The device as claimed in  claim 1 , wherein the projection objective is a microlithography projection objective. 
   
   
       8 . A projection exposure system, comprising:
 a projection objective;   a device which measures a state of polarization of optical radiation after the optical radiation passes through the projection objective, and which provides a corresponding measurement result; and   a manipulator which is controlled based on the measurement result.   
   
   
       9 . The projection exposure system as claimed in  claim 8 , wherein the manipulator sets at least one element of the projection objective based on the measurement result. 
   
   
       10 . The projection exposure system as claimed in  claim 8 , wherein all parts of the device are stationary during the measurement of the state of the polarization. 
   
   
       11 . The projection exposure system as claimed in  claim 8 , wherein the projection exposure system is a microlithography projection exposure system. 
   
   
       12 . A measurement and control method, comprising:
 measuring a state of polarization of optical radiation after the optical radiation passes through a projection objective; and   controlling a manipulator based on the measured state of the polarization of the optical radiation.