US2008225284A1PendingUtilityA1

Method, apparatus, and computer program product for optimizing inspection recipes using programmed defects

Assignee: IBMPriority: Oct 31, 2006Filed: May 28, 2008Published: Sep 18, 2008
Est. expiryOct 31, 2026(~0.2 yrs left)· nominal 20-yr term from priority
G01N 21/956G01N 21/93
55
PatentIndex Score
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Claims

Abstract

A method and computer program product for implementing inspection recipe services are provided. The method includes defining a modified reticle pitch for use in inspecting programmed defects on a test structure, the modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field on the test structure. The test structure includes a number of arrays linearly arranged on the test structure and spaced equidistant, and each of the arrays corresponds to a reticle field and includes a number of cells. The method also includes using the modified reticle field pitch and an alignment site on the test structure to perform a random mode inspection of the test structure.

Claims

exact text as granted — not AI-modified
1 . A method for implementing inspection recipe services, comprising:
 defining a modified reticle pitch for use in inspecting programmed defects on a test structure, the modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field on the test structure; wherein the test structure includes a number of arrays linearly arranged on the test structure and spaced equidistant, each of the arrays corresponding to a reticle field and comprising a number of cells; and   using the modified reticle field pitch and an alignment site on the test structure to perform a random mode inspection of the test structure.   
   
   
       2 . The method of  claim 1 , wherein the arrays are comprised of a pattern of logic circuitry. 
   
   
       3 . The method of  claim 1 , wherein defects comprise varying dimensions and include at least one of:
 horizontal open;   horizontal short;   vertical open; and   vertical short.   
   
   
       4 . The method of  claim 1 , wherein the modified reticle pitch is defined as a reticle field pitch plus an inter-array pitch. 
   
   
       5 . The method of  claim 1 , wherein defects are embedded into multiple mask layers of the test structure. 
   
   
       6 . The method of  claim 1 , wherein each of the arrays is 30 um by 90 um. 
   
   
       7 . A computer program product for implementing inspection recipe services, the computer program product including instructions for causing a computer to implement a method, comprising:
 defining a modified reticle pitch for use in inspecting programmed defects on a test structure, the modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field on the test structure; wherein the test structure includes a number of arrays linearly arranged on the test structure and spaced equidistant, each of the arrays corresponding to a reticle field and comprising a number of cells; and   using the modified reticle field pitch and an alignment site on the test structure to perform a random mode inspection of the test structure.   
   
   
       8 . The computer program product of  claim 7 , wherein the arrays are comprised of a pattern of logic circuitry. 
   
   
       9 . The computer program product of  claim 7 , wherein defects comprise varying dimensions and include at least one of:
 horizontal open;   horizontal short;   vertical open; and   vertical short.   
   
   
       10 . The computer program product of  claim 7 , wherein the modified reticle pitch is defined as a reticle field pitch plus an inter-array pitch. 
   
   
       11 . The computer program product of  claim 7 , wherein defects are embedded into multiple mask layers of the test structure. 
   
   
       12 . The computer program product of  claim 7 , wherein each of the arrays is 30 um by 90 um.

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