Photoresists and methods for use thereof

Abstract

New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.

1 - 19 . (canceled) 
   
   
       20 . A method for providing an ion-implanted semiconductor substrate comprising:
 providing a semiconductor substrate having coated thereon a relief image of chemically-amplified positive-acting photoresist composition,   wherein the photoresist comprises, prior to photoactivation, a resin that comprises units that contain photoacid-labile moieties in an amount of 12 mole percent or less, based on total units of the resin; and   applying ions to the substrate.   
   
   
       21 . A method for providing an ion-implanted semiconductor substrate comprising:
 providing a semiconductor substrate having coated thereon a relief image of chemically-amplified positive-acting photoresist composition,   wherein the photoresist comprises, prior to photoactivation, photoacid-labile groups that generate upon photoactivation a cleavage product that comprises 5 or more carbon atoms and/or a single or multiple ring structure; and   applying ions to the substrate.   
   
   
       22 . A method for providing an ion-implanted semiconductor substrate comprising:
 providing a semiconductor substrate having coated thereon a relief image of chemically-amplified positive-acting photoresist composition,   treating the photoresist composition image thermally or with radiation to remove volatile materials of the photoresist composition; and   applying ions to the substrate.   
   
   
       23 . A method for providing an ion-implanted semiconductor substrate comprising:
 providing a semiconductor substrate having coated thereon a relief image of chemically-amplified positive-acting photoresist composition,   treating the photoresist composition image to provide a coating thereon; and   applying ions to the substrate.