Surface with an Anti-Adhesion Microstructure and Method for Producing Same
Abstract
The invention relates to a surface comprising a microstructure that reduces adhesion and to a method for producing said microstructure. Microstructures of this type that reduce adhesion are known and are used, for example, to configure self-cleaning surfaces that us the Lotus effect. According to the invention, the surface is produced electrochemically by means of reverse pulse plating, the known microstructure being first produced and a nanostructure that is overlaid on the microstructure is produced at the same time or in a subsequent step. To achieve this for example, the pulse length of the current pulse that is used during the reverse pulse plating lies in the millisecond range and has a pulse length ratio greater than 1:3. The microstructure that has been produced, consisting of peaks and troughs is then overlaid with peaks and troughs of a smaller size order belonging to the nanostructure.
Claims
exact text as granted — not AI-modified1 .- 9 . (canceled)
10 . A method for electrochemically producing a surface with an anti-adhesion microstructure, comprising:
providing a macrostructure; arranging a microstructure on the macrostructure by electrochemical pulse plating; and arranging a nanostructure on the microstructure by reverse pulse plating.
11 . The method as claimed in claim 10 , wherein the reverse pulse plating pulse length for producing the nanostructure is less than 500 ms.
12 . The method as claimed in claim 11 , wherein a cathodic pulse is at least three times as long as an anodic pulse for reverse pulse plating.
13 . The method as claimed in claim 12 , wherein the cathodic pulse is implemented with a higher current density than the anodic pulse for reverse pulse plating.
14 . The method as claimed in claim 13 , wherein the pulse length for an upstream process step for producing the microstructure is at least one second.
15 . A surface with an anti-adhesion microstructure, comprising:
providing a microstructure; and superimposing a nanostructure on the microstructure by pulse plating to produce the surface.
16 . The surface as claimed in claim 15 , wherein the surface is superhydrophobic.
17 . The surface as claimed in claim 16 , wherein a macrostructure is superimposed on the microstructure and the nanostructure.
18 . The surface as claimed in claim 17 , wherein a pulse plating pulse length for producing the nanostructure is less than 500 ms.Join the waitlist — get patent alerts
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