US2008216562A1PendingUtilityA1
Pure darifenacin hydrobromide substantially free of oxidized darifenacin and salts thereof and processes for the preparation thereof
Assignee: TEVA PHARMACEUTICALS USA INC FPriority: Dec 27, 2005Filed: May 6, 2008Published: Sep 11, 2008
Est. expiryDec 27, 2025(expired)· nominal 20-yr term from priority
A61P 13/00C07D 405/06C07D 307/79C07D 207/09C07D 207/48
62
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Claims
Abstract
Provided are darifenacin hydrobromide free of oxidized darifenacin, and processes for the preparation thereof.
Claims
exact text as granted — not AI-modified1 . An HPLC method for determining the presence and level of oxidized darifenacin and salts thereof in a darifenacin hydrobromide sample comprising: (a) combining a darifenacin hydrobromide sample with a mixture of acetonitrile:water in a ratio of about 1:1, to obtain a solution; (b) injecting the solution into a 150×4.6 mm×5.0 μm Phenyl C6 column; (c) eluting the sample from the column using a mixture of acetonitrile:water in a ratio of 9:1 and buffer as an eluent; and (d) measuring the oxidized darifenacin content in the sample with a UV detector.
2 . A process of determining the presence of a compound of the following formula I
in a sample comprising the compound of formula I and a compound of the following formula II
by a process comprising carrying out HPLC or TLC with the compound of formula I as a reference marker, wherein Y is a leaving group selected from the group consisting of Cl, I, brosyl, mesyl, tosyl, trifluoroacetyl, and trifluoromethansulfonyl.
3 . The process of claim 2 , comprising: (a) measuring by HPLC or TLC the relative retention time corresponding to the compound of formula I in a reference marker sample; (b) determining by HPLC or TLC the relative retention time corresponding to the compound of formula I in a sample comprising a compound of formula I and a compound of formula II; and (c) determining the relative retention time of the compound of formula I in the sample by comparing the relative retention time of step (a) to the relative retention time of step (b).
4 . The process of claim 3 , wherein Y is Cl.
5 . A process of determining the amount of a compound of the following formula I
in a sample comprising the compound of formula I and a compound of the following formula II
by a process comprising carrying out an HPLC with the compound of formula I as a reference standard, wherein Y is a leaving group selected from the group consisting of Cl, I, brosyl, mesyl, tosyl, trifluoroacetyl, and trifluoromethansulfonyl.
6 . The process of claim 5 , comprising: (a) measuring by HPLC the area under a peak corresponding to a compound of formula I in a reference standard comprising a known amount of the compound of formula I; (b) measuring by HPLC the area under a peak corresponding to a compound of formula I in a sample comprising a compound of formula I and a compound of formula II; and (c) determining the amount of the compound of formula I in the sample by comparing the area of step (a) to the area of step (b).
7 . The process of claim 6 , wherein Y is Cl.
8 . The HPLC method of claim 3 , comprising: (a) combining a sample of the compound of formula I with a mixture of acetonitrile:water in a ration of about 1:1, to obtain a solution; (b) injecting the solution into a 250×4.6 mm×0.5 μm C18 column; (c) eluting the sample from the column using a mixture of acetonitrile and buffer as an eluent; and (d) measuring the amount of the compound of formula I in the sample with a UV detector at a wavelength of 215 nm.
9 . the method of claim 8 , wherein Y is Cl.
10 . The HPLC method of claim 6 , comprising: (a) combining a sample of the compound of formula I with a mixture of acetonitrile:water in a ratio of about 1:1, to obtain a solution; (b) injecting the solution into a 250×4.6 mm×0.5 μm C18 column; (c) eluting the sample from the column using a mixture of acetonitrile and buffer as an eluent; and (d) measuring the amount of the compound of formula I in the sample with a UV detector at a wavelength of 215 nm.
11 . The method of claim 10 , wherein Y is Cl.Join the waitlist — get patent alerts
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