Method for producing light-transmitting electromagnetic wave-shielding film, light-transmitting electromagnetic wave-shielding film and plasma display panel using the shielding film

Abstract

A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the metal silver portion carrying conductive metal particles. A method for producing a light-transmitting electromagnetic wave-shielding film which enables production of an electromagnetic wave-shielding material simultaneously having high EMI-shielding property and high transparency in a fine line pattern and also enables mass production of such films at a low cost, and a light-transmitting electromagnetic wave-shielding film obtained by the production method and free from the problem of moire are provided.

1 . A method for producing a light-transmitting electromagnetic wave-shielding film having a conductive metal portion and a light-transmitting portion, which comprises
 exposing a silver salt-containing layer to an electromagnetic wave, wherein the silver salt-containing layer contains a silver salt and the silver salt-containing layer is provided on a support,   developing said exposed silver salt-containing layer with a development technique used for a silver salt photographic film so as to form a metal silver portion and the light-transmitting portion, and   subjecting the metal silver portion to physical development and/or plating to form the conductive metal portion consisting of the metal silver portion carrying conductive metal particles.   
     
     
         2 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein the silver salt in the silver salt-containing layer is a silver halide. 
     
     
         3 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 2 , wherein the silver halide consists mainly of silver bromide. 
     
     
         4 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 2 , wherein the silver halide contains a rhodium compound and/or an iridium compound. 
     
     
         5 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 2 , wherein the silver halide contains Pd(II) ions and/or Pd metal. 
     
     
         6 . (canceled) 
     
     
         7 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein the silver salt in the silver salt-containing layer has a diameter as sphere of 0.1 to 100 nm. 
     
     
         8 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein the developer used for the development of the silver salt-containing layer is a lith developer. 
     
     
         9 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein an exposed portion after the development contains the metal silver at a content of 50% by weight or more based on the weight of silver contained in the exposed portion before the exposure. 
     
     
         10 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein the plating is performed by electroless plating. 
     
     
         11 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein the surface of the conductive metal portion is further subjected to a blackening treatment. 
     
     
         12 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein the light-transmitting portion does not substantially contain physical development nuclei. 
     
     
         13 . The method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein the light-transmitting electromagnetic wave-shielding film has a surface resistance of 2.5 Ω/sq or lower after the physical development and/or plating, and/or the light-transmitting portion has a transmittance of 95% or higher. 
     
     
         14 - 20 . (canceled) 
     
     
         21 . A method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein the support is a plastic film, a plastic plate or a glass plate. 
     
     
         22 . A method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , additionally comprising removing silver-salt from unexposed regions of the silver-salt containing layer. 
     
     
         23 . A method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein the binder includes water-soluble polymers. 
     
     
         24 . A method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , wherein the binder includes gelatin. 
     
     
         25 . A method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 1 , additionally comprising fixing the developed and exposed silver salt-containing layer. 
     
     
         26 . A method for producing a light-transmitting electromagnetic wave-shielding film according to  claim 2 , wherein the silver halide functions as an optical sensor.