US2008171493A1PendingUtilityA1

Polishing pad and method of producing the same

Assignee: SAN FANG CHEMICAL INDUSTRY COPriority: Jan 12, 2007Filed: Jan 12, 2007Published: Jul 17, 2008
Est. expiryJan 12, 2027(~0.5 yrs left)· nominal 20-yr term from priority
B24D 11/02B24B 37/20B24D 3/22Y10T442/608
47
PatentIndex Score
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Claims

Abstract

The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a non-woven fabric and an elastomer. The non-woven fabric is made of a long fiber and the elastomer is embedded into the fabric.

Claims

exact text as granted — not AI-modified
1 . A polishing pad comprising a base material having a surface for polishing a substrate, wherein the surface comprises non-woven fabric and an elastomer, the non-woven fabric is made of a long fiber and the elastomer is embedded into the fabric. 
     
     
         2 . The polishing pad according to  claim 1 , wherein the long fiber is selected from the group consisting of a single fiber and composite fibers. 
     
     
         3 . The polishing pad according to  claim 1 , wherein the long fiber is made of at least one material selected from the group consisting of polyamide, terephthalamide, polyester, polymethyl methacrylate, polyethylene terephthalate, polyacrylonitrile, and mixtures thereof. 
     
     
         4 . The polishing pad according to  claim 1 , wherein the length of the long fiber is more than 10 cm. 
     
     
         5 . The polishing pad according to  claim 1 , wherein the long fiber is a sea-island fiber. 
     
     
         6 . The polishing pad according to  claim 1 , wherein the non-woven fabric comprises a net frame. 
     
     
         7 . The polishing pad according to  claim 6 , wherein the net frame is made of the long fiber. 
     
     
         8 . The polishing pad according to  claim 1 , wherein the elastomer is a foam resin. 
     
     
         9 . A method of polishing a substrate, the method comprising a step of using the polishing pad according to  claim 1  to polish a surface of the substrate. 
     
     
         10 . A method of producing the polishing pad according to  claim 1 , comprising steps of:
 (a) providing the base material comprising the non-woven fabric made of the long fiber;   (b) impregnating the surface of the base material with an elastomer solution; and   (c) curing the elastomer impregnated in the surface of the base material.   
     
     
         11 . The method according to  claim 10 , wherein the long fiber is selected from the group consisting of a single fiber and composite fibers. 
     
     
         12 . The method according to  claim 10 , wherein the long fiber is made of at least one material selected from the group consisting of polyamide, terephthalamide, polyester, polymethyl methacrylate, polyethylene terephthalate, polyacrylonitrile, and mixtures thereof. 
     
     
         13 . The method according to  claim 10 , wherein a length of the long fiber is more than 10 cm. 
     
     
         14 . The method according to  claim 10 , wherein the long fiber is a sea-island fiber. 
     
     
         15 . The method according to  claim 10 , wherein the non-woven fabric comprises a net frame. 
     
     
         16 . The method according to  claim 15 , wherein the net frame is made of the long fiber. 
     
     
         17 . The method according to  claim 10 , wherein the elastomer is a foam resin. 
     
     
         18 . The method according to  claim 10 , further comprising a step (cl) of washing the surface of the base material after the step (c). 
     
     
         19 . The method according to  claim 18 , further comprising a step (c2) of drying the surface of the base material after the step (c1). 
     
     
         20 . The method according to  claim 10 , further comprising a step (c3) of mechanically polishing the surface of the base material and the elastomer after the step (c).

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