Optical System of a Microlithographic Projection Exposure Apparatus

Abstract

An optical system of a microlithographic projection exposure apparatus ( 10 ) contains a module ( 50; 150 ), which can be fitted in the optical system and removed from it as a unit. The module contains a cavity ( 42; 142 ) which can be completely filled with a liquid ( 34; 134 ) and hermetically sealed, and a concavely curved optical surface (S) which bounds the cavity at the top during operation of the projection exposure apparatus ( 10 ). This makes it possible to fill the module outside the optical system, The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.

1 . An optical System comprising a module, which can be fitted in the optical system and removed from it as a unit, said module comprising:
 a) a cavity which is configured to be completely filled with a liquid and to, be hermetically sealed, and   b) a concavely curved optical surface, which bounds the cavity at the top during operation of the projection exposure apparatus   wherein the optical system is an optical system of a microlithographic projection exposure apparatus.   
   
   
       2 . An optical system according to  claim 1 , wherein the cavity is bounded at the bottom by a lens during operation of the projection exposure apparatus. 
   
   
       3 . An optical system according to  claim 2 , wherein the lens is a plane-parallel plate. 
   
   
       4 . An optical system according to  claim 2  wherein the lens is the last optical element of the optical system from which light emerges during operation of the projection exposure apparatus. 
   
   
       5 . An optical system according to  claim 2 , wherein the surface of the lens facing away from the cavity lies next to a further cavity, which is arranged below the cavity during operation of the projection exposure apparatus and which is configured to be completely filled with a liquid during operation of the projection exposure apparatus. 
   
   
       6 . An optical system according to  claim 5 , wherein the further cavity is bounded at the bottom by the last optical element of the optical system from which light emerges during operation of the projection exposure apparatus. 
   
   
       7 . An optical system according to  claim 2 , wherein
 a) the concavely curved optical surface is part of a first lens, which is held in a first lens mount,   b) a second lens, which bounds the cavity at the bottom during operation of the projection exposure apparatus, is held in a second mount, and wherein,   c) the first mount and the second mount are hermetically connected to each other.   
   
   
       8 . An optical system according to  claim 7 , wherein an intermediate element is arranged between the first mount and the second mount. 
   
   
       9 . An optical system according to  claim 8 , wherein the intermediate element is annular. 
   
   
       10 . An optical system according to  claim 1 , wherein the module contains a supply channel to introduce a liquid into the cavity. 
   
   
       11 . An optical system according to  claim 1 , wherein the module contains a vent channel to discharge air from the cavity. 
   
   
       12 . An optical system according to  claim 7 , wherein the supply channel and the vent channel are formed in the intermediate element. 
   
   
       13 . An optical system according to  claim 1 , which is configured as a projection objective to image structures contained in a mask into an image plane. 
   
   
       14 . An optical system according to  claim 1 , wherein
 a) the optical system is an immersion objective of the projection exposure apparatus,   b) the concavely curved optical surface is the last optical surface of the immersion objective during operation of the projection exposure apparatus, and wherein   c) the cavity is hermetically sealed by a releasably fastened closure element in the direction of an image plane of the immersion objective.   
   
   
       15 . An optical system according to  claim 14 , wherein the liquid is an immersion liquid. 
   
   
       16 . An optical system according to  claim 14 , wherein the closure element is at least partially transparent. 
   
   
       17 . An optical system according to  claim 14 , wherein the closure element comprises a plane-parallel plate. 
   
   
       18 . An optical system according to  claim 14 , wherein a connection of the closure element to a connecting part for the module is electrically, magnetically or hydromechanically releasable. 
   
   
       19 . An optical system according to  claim 14 , wherein the closure element is configured to be fastened to the connecting part by a reduced pressure that can be set up in the cavity. 
   
   
       20 . An optical system according to  claim 14 , wherein the cavity is connectable to a liquid reservoir via a closable line. 
   
   
       21 . An immersion objective, comprising:
 a) a lens which has a concavely curved surface on the image side and is the last optical element on the image side,   b) a lens holder to hold the lens,   c) a closure element, which is releasably connectable to the lens holder directly or via an intermediate element, so as to create a sealable cavity  42 ′) to hold a liquid between the lens and the closure element,
 wherein the lens holder, together with the closure element connected to it, form a module which is configured to be fitted in the immersion objective and to be removed therefrom as a unit, and the immersion objective is an immersion objective of a microlithographic projection exposure apparatus. 
   
   
   
       22 . A immersion objective according to  claim 21 , wherein a connection of the closure element to a connecting part for the module is electrically, magnetically or hydromechanically releasable. 
   
   
       23 . An optical system, comprising:
 a) a cavity which is configured to be completely filled with a liquid and to be hermetically sealed,   b) a concavely curved optical surface, which bounds the cavity at the top during operation of the projection exposure apparatus, and   c) a displacement element which is arranged in the cavity and is movable into a displacement position where the displacement element bears substantially seamlessly on the concavely curved optical surface,   wherein the optical system is an optical system of a microlithographic projection exposure apparatus.   
   
   
       24 . An optical system according to  claim 23 , wherein a gap having a width of less than 0.5 mm remains between the concavely curved optical surface and the displacement element when it is in the displacement position. 
   
   
       25 . An optical system according to  claim 24 , wherein the width of the gap is less than 0.1 mm. 
   
   
       26 . An optical system according to  claim 23 , wherein the displacement element has a curvature which is greater in magnitude than that of the concavely curved surface. 
   
   
       27 . An optical system according to  claim 23 , wherein the displacement element is a deformable membrane. 
   
   
       28 . An optical system according to  claim 27 , wherein the membrane divides the cavity into a first subspace, which is next to the concavely curved optical surface, and a second subspace which is not next to the concavely curved optical surface, and wherein the optical system is configured to set up a positive pressure relative to the first subspace in the second subspace. 
   
   
       29 . An optical system according to  claim 27 , wherein the membrane is at least partially permeable for gases. 
   
   
       30 . An optical system according to one of  claims 27 , wherein the membrane is partially permeable for the liquid. 
   
   
       31 . An optical system according to  claim 23 , wherein the displacement element is a solid body having a surface which is shaped as the negative of the concavely curved optical surface. 
   
   
       32 . An optical system according to  claim 31 , wherein the displacement element is configured to move out of a light path of the optical system by lateral movement. 
   
   
       33 . An optical system according to  claim 23 , wherein the displacement element is soluble in a liquid. 
   
   
       34 . An apparatus comprising:
 a) an immersion objective with a lens which has a surface curved concavely upwards on the image side and is the last optical element on the image side,   b) a displacement element which is movable into a displacement position where the displacement element bears substantially seamlessly on the concavely curved optical surface,   wherein the apparatus is a microlithographic projection exposure apparatus.   
   
   
       35 . An apparatus according to  claim 34 , wherein a gap having a width of less than 0.5 mm remains between the concavely curved optical surface and the displacement element when it is in the displacement position. 
   
   
       36 . An apparatus according to  claim 35 , wherein the width of the gap is less than 0.1 mm. 
   
   
       37 . An apparatus according to  claim 34 , wherein the displacement element has a curvature which is greater in magnitude than that of the concavely curved surface. 
   
   
       38 . An apparatus according to  claim 34 , wherein the displacement element is a deformable membrane. 
   
   
       39 . An apparatus according to  claim 38 , wherein a positive pressure can be applied on the membrane on a side facing away from the lens. 
   
   
       40 . An apparatus according to  claim 39 , comprising a pressure space adapted to being filled with a fluid, the pressure space being arranged next to the membrane on a side facing away from the lens. 
   
   
       41 . An apparatus according to  claim 40 , wherein the membrane and the pressure space are received in a movable substrate stage to move a substrate carrying a layer to be exposed. 
   
   
       42 . An apparatus according to  claim 40 , wherein the fluid is an immersion liquid for which the membrane is partially permeable. 
   
   
       43 . An apparatus according to  claim 34 , wherein the displacement element is a solid body having a surface which is shaped as the negative of the concavely curved optical surface. 
   
   
       44 . An apparatus according to  claim 43 , wherein the displacement element is movable into the displacement position by vertical movement. 
   
   
       45 . An apparatus according to  claim 43 , wherein the displacement elements is held in a resting position in a movable substrate stage to move a substrate carrying a layer to be exposed. 
   
   
       46 . An optical system of a microlithographic projection exposure apparatus, comprising:
 a) an optical surface which is concavely curved upwards during operation of the projection exposure apparatus and has an apex,   b) a channel having an opening which is adapted to be positioned immediately next to the apex before operation of the projection exposure apparatus.   
   
   
       47 . An optical system according to  claim 46 , wherein the channel is connected to a gas pump to pump away gas which accumulates below the optical surface. 
   
   
       48 . An optical system according to  claim 46 , wherein the channel is connected to a liquid pump to introduce a liquid below the optical surface. 
   
   
       49 . An optical system according to  claim 46 , wherein the channel comprises a first subsection and a second subsection, which is connected to the first subsection via an articulation, the subsections being tiltable relative to each other via the articulations. 
   
   
       50 . A optical system according to  claim 46 , wherein the channel contains a material which has a shape memory. 
   
   
       51 . An optical system according to  claim 46 , wherein the channel is a rigid curved tube. 
   
   
       52 . An optical system according to  claim 46 , wherein the channel is soluble in a liquid. 
   
   
       53 . An optical system, comprising a lens having:
 a) an optical surface which is concavely curved upwards during operation of the projection exposure apparatus and has an apex,   b) a channel which extends inside the lens and has a first opening and a second opening, the first opening being situated at the apex of the optical surface,   wherein the optical system is an optical system of a microlithographic projection exposure apparatus.   
   
   
       54 . An optical system according to  claim 53 , wherein the channel extends coaxially with a symmetry axis of the lens. 
   
   
       55 . An optical system according to  claim 53 , wherein the second opening is arranged at an edge of the lens. 
   
   
       56 . A method for completely filling a hermetically sealable cavity with a liquid, wherein the cavity is part of a module constructed as a design unit of an optical system of a microlithographic projection exposure apparatus, and wherein the module has a concavely curved optical surface and a vent opening to release a gas contained in the cavity, said method comprising:
 a) tilting the module outside the optical system such that the vent opening points upwards;   b) filling the cavity with the liquid;   c) fitting the module into the optical system so that the concavely curved optical surface points upwards.