Method of producing diffractive thin-film piezoelectric micromirror

Abstract

Disclosed is a method of producing a diffractive micromirror. More particularly, the present invention pertains to a method of producing a diffractive micromirror, in which a recess having a desired depth and width is precisely formed in a piezoelectric operation manner.

1 . A method of producing a diffractive thin-film piezoelectric micromirror, comprising:
 forming an insulating layer in a substrate so that the insulating layer has a predetermined thickness from a predetermined depth of the substrate;   applying a mask on the substrate and subsequently forming oxidized walls;   forming a piezoelectric layer on the substrate; and   removing a sacrificial portion of the insulating layer to create a gap between the piezoelectric layer and the substrate to complete production of the diffractive thin-film piezoelectric micromirror.   
     
     
         2 . The method as set forth in  claim 1 , further comprising patterning the piezoelectric layer to produce a diffractive thin-film piezoelectric micromirror array. 
     
     
         3 . The method as set forth in  claim 2 , wherein the piezoelectric layer is patterned prior to removal of the sacrificial portion of the insulating layer. 
     
     
         4 . The method as set forth in  claim 2 , wherein the piezoelectric layer is patterned after removal of the sacrificial portion of the insulating layer. 
     
     
         5 . The method as set forth in  claim 1 , wherein the step of applying a mask on the substrate and subsequently forming oxidized walls comprises:
 laminating the mask on the substrate; and   implanting an oxidizing agent into the substrate to form the oxidized walls.   
     
     
         6 . The method as set forth in  claim 1 , wherein the step of applying a mask on the substrate and subsequently forming oxidized walls comprises:
 laminating the mask on the substrate; and   providing water and oxygen to the substrate at high temperatures to form the oxidized walls.   
     
     
         7 . The method as set forth in  claim 1 , further comprising a further step of forming a supporter for supporting the piezoelectric layer on the substrate after the step of applying a mask on the substrate and subsequently forming oxidized walls. 
     
     
         8 . The method as set forth in  claim 1 , wherein the step of forming a piezoelectric layer on the substrate comprises:
 forming a first electrode layer on the substrate;   forming a piezoelectric material layer on the first electrode layer; and   forming a second electrode layer having a micromirror function on the piezoelectric material layer.   
     
     
         9 . The method as set forth in  claim 8 , further comprising: patterning the piezoelectric layer including the first electrode, the piezoelectric material, and the second electrode layers to form a diffractive thin-film piezoelectric micromirror array. 
     
     
         10 . The method as set forth in  claim 9 , further comprising removing a portion of the piezoelectric layer which does not correspond in position to the sacrificial portion of the insulating layer after the patterning of the piezoelectric layer. 
     
     
         11 . The method as set forth in  claim 7 , wherein the step of forming a piezoelectric layer on the substrate comprises:
 forming a first electrode layer on the substrate;   forming a piezoelectric material layer on the first electrode layer;   removing an intermediate part of the piezoelectric layer which has a predetermined width and corresponds in position to the sacrificial portion of the insulating layer; and   forming a micromirror layer on the supporter.   
     
     
         12 . The method as set forth in  claim 11 , further comprising:
 patterning the piezoelectric layer including the supporter, first electrode layer, piezoelectric material layer, and second electrode layer to form a diffractive thin-film piezoelectric micromirror array.   
     
     
         13 . A method of producing a diffractive thin-film piezoelectric micromirror array, comprising:
 forming an insulating layer in a substrate so that the insulating layer has a predetermined thickness from a predetermined depth of the substrate;   applying a mask on the substrate and subsequently forming oxidized walls;   forming a piezoelectric layer on the substrate;   removing a sacrificial portion of the insulating layer to create a gap between the piezoelectric layer and the substrate; and   patterning the piezoelectric layer to produce a diffractive thin-film piezoelectric micromirror array.   
     
     
         14 . The method as set forth in  claim 13 , wherein the step of applying a mask on the substrate and subsequently forming oxidized walls comprises:
 laminating the mask on the substrate; and   implanting an oxidizing agent into the substrate to form the oxidized walls.   
     
     
         15 . The method as set forth in  claim 13 , wherein the step of applying a mask on the substrate and subsequently forming oxidized walls comprises:
 laminating the mask on the substrate; and   providing water and oxygen to the substrate at high temperatures to form the oxidized walls.   
     
     
         16 . The method as set forth in  claim 13 , further comprising the step of forming a support layer on the substrate for supporting the piezoelectric layer after the step of applying a mask on the substrate and forming oxidized walls. 
     
     
         17 . The method as set forth in  claim 16 , wherein the step of forming a piezoelectric layer on the substrate comprises:
 forming a first electrode layer on the support layer;   forming a piezoelectric material layer on the first electrode layer; and   forming a second electrode layer having a micromirror function on the piezoelectric material layer.   
     
     
         18 . The method as set forth in  claim 16 , wherein the step of forming a piezoelectric layer on the substrate comprises:
 forming a first electrode layer on the support layer;   forming a piezoelectric material layer on the first electrode layer;   removing an intermediate portion of the piezoelectric layer corresponding to the location of the sacrificial portion of the insulating layer; and   forming a micromirror layer on the support layer from where the intermediate portion of the piezoelectric layer was removed.   
     
     
         19 . The method as set forth in  claim 13 , wherein the step of forming a piezoelectric layer on the substrate comprises:
 forming a first electrode layer on the substrate;   forming a piezoelectric layer on the first electrode layer; and   forming a second electrode layer on the piezoelectric layer, said second electrode layer having a micromirror function.   
     
     
         20 . The method as set forth in  claim 13 , wherein the step of forming a piezoelectric layer on the substrate comprises:
 forming a first electrode layer on the substrate;   forming a piezoelectric material layer on the first electrode layer;   removing an intermediate portion of the piezoelectric layer disposed at a location corresponding to the location of the sacrificial portion of the insulating layer; and   forming a micromirror layer on the substrate at a location where the piezoelectric layer was removed.