Plasma processing apparatus

Abstract

This invention concerns with the plasma inactivating method and processor that can inactivate the surface of the object without causing the degradation inside of it. The inactivation of toxins on the surface of the object proceeds as removing the toxins by nitriding or oxidizing the toxins by the following triple effects, the sharp pulsed electric field by the supply of the electric pulses, the generated N-radicals (N*) contained inside of the plasma in the surrounding gases composed mainly by N 2 gas under the low pressure.

1 . A plasma processing apparatus for inactivating toxins sticking to the surface of a treatment object, comprising:
 ambient gas adjusting means for adjusting ambient gas of a space, in which an inactivation process is scheduled, so as to provide a nitrogen ambient gas;   an electrode pair disposed in the space;   a pulse power supply for applying electric pulses repeatedly to the electrode pair, inducing fine streamer discharge without inducing arc discharge; and   a reflection member for reflecting back the short wavelength ultraviolet ray into the inside of the space, the short wavelength ultraviolet ray going from the inside of the space to outside,   wherein toxins are nitrided and oxidized, and toxins are removed from the surface of tho treatment object, by treating toxins by applying   pulse electric field generated by application of the electric pulse to the electrode pair,   nitrogen radicals contained in the plasma generated in the nitrogen ambient gas due to fine streamer discharge, and   short wavelength ultraviolet rays generated by the nitrogen ambient gas due to fine streamer discharge.   
     
     
         2 . The plasma processing apparatus according to  claim 1 , wherein the toxins are endotoxin or abnormal prion. 
     
     
         3 . The plasma processing apparatus according to  claim 1 , wherein the half width of pulse width of electric pulse is 50 to 300 ns. 
     
     
         4 . The plasma processing apparatus according to  claim 1 , wherein the ambient gas adjusting means supplies nitrogen gas from an anode side, and exhausts nitrogen gas from a cathode side, the anode and the cathode side implementing the electrode pair. 
     
     
         5 . The plasma processing apparatus according to  claim 1 , wherein the ambient gas adjusting means includes evacuating means for evacuating the space. 
     
     
         6 . The plasma processing apparatus according to  claim 1 , further comprising:
 temperature adjusting means for adjusting the temperature of the nitrogen ambient gas.   
     
     
         7 . The plasma processing apparatus according to  claim 1 , wherein the reflection member reflects short wavelength ultraviolet rays by an aluminum film.