Multilayer optic device and system and method for making same

Abstract

An optic device, system and method for making are described. The optic device includes a first solid phase layer having a first index of refraction with a first photon transmission property and a second solid phase layer having a second index of refraction with a second photon transmission property. The first and second layers are conformal to each other. The optic device may be fabricated by vapor depositing a first layer and then vapor depositing a second layer thereupon. The first layer may be deposited onto a blank or substrate. The blank or substrate may be rotated during deposition. Further, a computer-controlled shutter may be used to alter the deposition rate of material along an axis of the optic device. Alternatively, the optic device may be moved at varying speeds through a vapor stream to alter the deposition rate of material.

1 - 34 . (canceled) 
   
   
       35 . A method for forming an optic, comprising:
 forming a first solid phase layer, characterized by a first index of refraction, onto a blank; and   forming on the first solid phase layer a second solid phase layer, characterized by a second index of refraction;   wherein between said first solid phase layer, said blank, and said second solid phase layer are at least two photon redirection regions.   
   
   
       36 . The method of  claim 35 , wherein said forming comprises vapor depositing, thermal spray depositing, or electroplating. 
   
   
       37 . The method of  claim 36 , wherein said vapor depositing comprises sputtering, ion implantation, ion plating, laser deposition, evaporation, or jet vapor deposition. 
   
   
       38 . The method of  claim 36 , wherein said thermal spray depositing comprises combustion, electric arc, or plasma spray. 
   
   
       39 . The method of  claim 35 , further comprising altering a forming rate of said forming. 
   
   
       40 . The method of  claim 39 , wherein said forming comprises depositing, and wherein said depositing comprises altering a rate of deposition. 
   
   
       41 . The method of  claim 40 , wherein said altering comprises moving a source of deposition material or the blank relative to each other. 
   
   
       42 . The method of  claim 40 , wherein said altering comprises moving the blank relative to a source of deposition material. 
   
   
       43 . The method of  claim 40 , wherein said altering comprises:
 providing a shutter; and   moving the shutter along an axis of the blank at a changing velocity.   
   
   
       44 . The method of  claim 43 , comprising rotating or oscillating the blank during said forming steps. 
   
   
       45 . The method of  claim 43 , comprising controlling the shutter electronically, mechanically, or manually. 
   
   
       46 . The method of  claim 44 , wherein said electronically controlling is performed through the use of a computer, microcontroller, or microprocessor. 
   
   
       47 . The method of  claim 35 , wherein said forming a first solid phase layer comprises forming the first solid phase layer on a substrate. 
   
   
       48 . The method of  claim 47 , wherein said substrate serves as a mold and is removable from a formed optic. 
   
   
       49 . The method of  claim 48 , wherein the mold comprises a cone-shaped core and wherein said forming steps comprise forming said first and second solid phase layers partially around the core. 
   
   
       50 . The method of  claim 49 , comprising abutting a diffracting crystal against either an input face or an output face of a formed optic.