Optical switching in lithography system

Abstract

A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

1 . A maskless lithography system for transferring a pattern onto the surface of a target, comprising:
 a charged particle beam generator generating a charged particle beam;   a beam splitter splitting said beam into a plurality of beamlets;   an optical system realizing said beamlets to be directed towards projection lenses without common cross-over in said system;   said system thereto being provided with subsequent electrostatic arrays influencing said beamlets;   said projection lenses projecting said beamlets on to said target,   therein reducing the cross section of said individual beamlets.   
     
     
         2 . The system according to  claim 1 , in which modulating means for modulating individual beamlets are included between said splitter and said projection lenses. 
     
     
         3 . The system according to  claim 2 , wherein said modulating means includes an electrostatic modulator deflector array and a beam stop array. 
     
     
         4 . The system according to  claim 1 , in which a scanning deflector array is provided, for deflecting individual beamlets in a first writing direction over said target. 
     
     
         5 . The system according to  claim 4 , in which the said scanning deflector array and said projection lenses are positioned in mutually close vicinity; 
     
     
         6 . The system according to  claim 1 , wherein said scanning deflector array and projection lenses are positioned in the system in close vicinity to said target surface. 
     
     
         7 . The system according to  claim 1 , wherein during writing, the target surface moves with respect to the system in a second writing direction. 
     
     
         8 . The system according to  claim 1 , further comprising a modulation array which comprises an array of modulators, wherein each modulator is adapted for either deflecting a beamlet away from its optical axis or letting a beamlet pass undeflected, which undeflected beamlets pass towards said scanning deflector array. 
     
     
         9 . The system according to  claim 8 , wherein a deflected beamlet is prevented from reaching the target. 
     
     
         10 . The system according to  claim 8 , further comprising a beam stop array between said modulation array and said deflector array, wherein said beam stop is arranged for stopping beamlets deflected away from the optical axis. 
     
     
         11 . The system according to  claim 1 , wherein said modulator array is controlled using modulated light beams, wherein each light beam holds part of the pattern data for controlling one or more modulators. 
     
     
         12 . The system according to  claim 11 , wherein said light beams are projected on said modulator array using an optical system. 
     
     
         13 . The system according to  claim 11 , wherein a modulated light beam from an optical fiber end is projected on a light sensitive element of a modulator. 
     
     
         14 . The system according to  claim 13 , wherein said light sensitive elements are located in the vicinity of one ore more individual modulators, and wherein said light beams are directed into the virtual space column defined by said plurality of parallel beamlets. 
     
     
         15 . The system according to  claim 13 , wherein said optical fiber end is part of an optical fiber for transmitting pattern data from a control unit comprising said pattern data, towards said modulator array. 
     
     
         16 . The system according to  claim 1 , wherein said beam generating means comprising a beam generator, a system for shaping the same into a parallel beam, and a beam splitter for generating a plurality of substantially parallel beamlets. 
     
     
         17 . The system according to  claim 1 , wherein said beam generating means comprising a beam generator, a system for shaping the same into a parallel beam, and a beam splitter for generating a plurality of substantially parallel beamlets, which beamlets are directed to said modulation array. 
     
     
         18 . The system according to  claim 17 , wherein beamlets are maintained substantially parallel up to projection onto said target. 
     
     
         19 . The system according to  claim 1 , wherein said beam generator comprises an electron beam generating means.