US2008155826A1PendingUtilityA1

Method of manufacturing mems ics

Assignee: SILVERBROOK RES PTY LTDPriority: Dec 2, 2002Filed: Mar 12, 2008Published: Jul 3, 2008
Est. expiryDec 2, 2022(expired)· nominal 20-yr term from priority
B41J 2/04563H04N 1/405G06F 21/71B41J 2/04586G06F 21/74Y10S707/99939Y10T29/49401B41J 2/04505B41J 2/04543G06F 21/78G06F 21/554B41J 2/04573B41J 2/04541G06F 21/73B41J 2/0451G06F 21/57H03K 5/1252B41J 2/04528G06F 21/575B41J 2/04508B41J 2202/20G06F 21/64Y10S707/99933
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Claims

Abstract

Methods of manufacturing an integrated circuit incorporating MEMS are provided. The methods include laying out the integrated circuit using a plurality of overlapping reticles.

Claims

exact text as granted — not AI-modified
1 . A method of manufacturing an integrated circuit incorporating MEMS, comprising laying out the integrated circuit using a plurality of overlapping reticles. 
     
     
         2 . A method according to  claim 1 , wherein the overlapping reticles are the same as each other. 
     
     
         3 . A method according to  claim 1 , wherein the reticles are different to each other. 
     
     
         4 . A method according to  claim 3 , wherein the reticles are different lengths. 
     
     
         5 . A method of manufacturing an integrated circuit printhead according to  claim 1 . 
     
     
         6 . A method of manufacturing a plurality of integrated circuits on a single substrate wafer, wherein each of the integrated circuits is manufactured in accordance with  claim 1 . 
     
     
         7 . A method according to  claim 6 , wherein at least some of the integrated circuits are different to each other. 
     
     
         8 . A method according to  claim 7 , wherein the integrated circuits are of different lengths. 
     
     
         9 . A method laying out an integrated circuit incorporating MEMS, the method including the steps of:
 defining a layout of an integrated circuit;   defining a joint path; and   modifying at least one element within an overlap area adjacent the joint path to take into account reticle field overlap during a subsequent manufacturing step.

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