Device and method for the determination of imaging errors and microlithography projection exposure system

Abstract

A device, a microlithography projection exposure system, and a method for the determination of imaging errors of an optical imaging system using a radiation-superposition measuring technique which operates with lateral phase offset, having an optical element arranged on the object side of the imaging system, having a first periodic structure on the object side with a predetermined periodicity direction, an optical element arranged on the image side of the imaging system, having a second periodic structure on the image side with a periodicity direction corresponding to the first periodic structure, and a detector to detect the superposition pattern of an image of the first periodic structure with the second periodic structure.

1 . A device for the measurement of imaging errors of an optical imaging system, the device comprising:
 an optical element arranged on the object side of the imaging system, having a first periodic structure on the object side;   an optical element arranged on the image side of the imaging system, having a second periodic structure on the image side; and   a detector to detect an interference or superposition pattern;   wherein the device uses at least one of a radiation-superposition measuring technique, which operates with lateral phase offset, and a Moiré measuring technique,   the interference or superposition pattern is formed by an image of the first periodic structure together with the second periodic structure, or by an image of the second periodic structure together with the first periodic structure, and the device measures the imaging errors with a measurement speed of at least about 1 kHz.   
   
   
       2 . A device for the measurement of imaging errors of an optical imaging system, the device comprising:
 an optical element arranged on the object side of the imaging system, having a first periodic structure on the object side;   an optical element arranged on the image side of the imaging system, having a second periodic structure on the image side; and   a detector to detect an interference or superposition pattern;   wherein the device uses at least one of a radiation-superposition measuring technique, which operates with lateral phase offset, and a Moiré measuring technique,   the interference or superposition pattern is formed by an image of the first periodic structure together with the second periodic structure, or by an image of the second periodic structure together with the first periodic structure, and   the device measures a Petzval surface tilt during an exposure operation of the optical imaging system.   
   
   
       3 . A device for the measurement of imaging errors of an optical imaging system, the device comprising:
 an optical element arranged on the object side of the imaging system, having a first periodic structure on the object side;   an optical element arranged on the image side of the imaging system, having a second periodic structure on the image side; and   a detector to detect an interference or superposition pattern;   wherein the device uses at least one of a radiation-superposition measuring technique, which operates with lateral phase offset, and a Moiré measuring technique,   the interference or superposition pattern is formed by an image of the first periodic structure together with the second periodic structure, or by an image of the second periodic structure together with the first periodic structure, and   the device measures a Petzval surface tilt by a time-resolved measurement.   
   
   
       4 . The device according to  claim 1 ,  2 , or  3 , further comprising a control loop to compensate for one or more imaging errors which have been measured. 
   
   
       5 . The device according to  claim 4 , wherein the control loop controls at least one of the image distance in the z direction, the object distance in the z direction, the image position in the xy direction, the object position in the xy direction, a relative tilt of the image plane, and a relative tilt of the object plane for the optical image imaging system as a function of an output signal of the detector. 
   
   
       6 . The device according to  claim 4 , wherein the control loop acts on at least one manipulator of the optical imaging system, the at least one manipulator being selected from the group which comprises at least one manipulator for adjusting one or more optical components respectively in one, two or three spatial directions, at least one manipulator for adjusting an object support, a manipulator for adjusting an image support, a manipulator for adjusting an ambient pressure and a manipulator for changing the refractive index of an immersion liquid. 
   
   
       7 . A method for measuring imaging errors of an optical imaging system, the method comprising:
 using at least one of a radiation-superposition measuring technique, which operates with lateral phase offset, and a Moiré measuring technique; and   evaluating an interference or superposition pattern which is generated by the measuring technique;   wherein the imaging errors are measured with a measurement speed of at least about 1 kHz.   
   
   
       8 . A method for measuring imaging errors of an optical imaging system, the method comprising:
 using at least one of a radiation-superposition measuring technique, which operates with lateral phase offset, and a Moiré measuring technique;   evaluating an interference or superposition pattern which is generated by the measuring technique; and   measuring a Petzval surface tilt during an exposure operation of the optical imaging system.   
   
   
       9 . A method for measuring imaging errors of an optical imaging system, the method comprising:
 using at least one of a radiation-superposition measuring technique, which operates with lateral phase offset, and a Moiré measuring technique;   evaluating an interference or superposition pattern which is generated by the measuring technique; and   measuring a Petzval surface tilt by a time-resolved measurement.   
   
   
       10 . A device for the measurement of imaging errors of an optical imaging system, the device comprising:
 at least one of a radiation-superposition measuring device, which operates with lateral phase offset, and a Moiré measuring device,   wherein the device measures the imaging errors with a measurement speed of at least about 1 kHz.   
   
   
       11 . A device for the measurement of imaging errors of an optical imaging system, the device comprising:
 at least one of a radiation-superposition measuring device, which operates with lateral phase offset, and a Moiré measuring device,   wherein the device measures a Petzval surface tilt during an exposure operation of the optical imaging system.   
   
   
       12 . A device for the measurement of imaging errors of an optical imaging system, the device comprising:
 at least one of a radiation-superposition measuring device, which operates with lateral phase offset, and a Moiré measuring device,   wherein the device measures a Petzval surface tilt by a time-resolved measurement.