Methods for forming a read sensor

Abstract

A method of making a magnetic head comprises depositing first and second lead layers in first and second end regions which surround a central region; and forming a read sensor in the central region such that a first edge of the read sensor is disposed above an upper edge of the first lead layer and a second edge of the read sensor is disposed above an upper edge of the second lead layer.

1 - 9 . (canceled) 
     
     
         10 . A method of making a magnetic head, comprising:
 depositing first and second lead layers in first and second end regions which surround a central region; and   forming a read sensor in the central region such that a first edge of the read sensor is disposed above an upper edge of the first lead layer and a second edge of the read sensor is disposed above an upper edge of the second lead layer.   
     
     
         11 . The method of  claim 10 , wherein depositing the first and the second lead layers and forming the read sensor define a track width for the read sensor. 
     
     
         12 . The method of  claim 10 , wherein forming the read sensor in the central region further includes forming the read sensor in the
 first and the second end regions.   
     
     
         13 . The method of  claim 10 , further comprising:
 after forming the read sensor, depositing first and second bias layers in the first and the second end regions and adjacent the read sensor.   
     
     
         14 . The method of  claim 10 , further comprising:
 after forming the read sensor, depositing first and second bias layers in the first and the second regions and adjacent the read sensor; and   depositing a gap layer over the first and the second bias layers and the read sensor.   
     
     
         15 . The method of  claim 10 , further comprising:
 prior to forming the read sensor, depositing first and second bias layers in the first and the second end regions over the first and the second lead layers; and   wherein forming the read sensor in the central region is such that the first edge of the read sensor is disposed above an edge of the first bias layer and the second edge of the read sensor is disposed above an edge of the second bias layer.   
     
     
         16 . The method of  claim 10 , wherein forming the read sensor further comprises:
 depositing sensor materials in the first and the second end regions and the central region;   forming a lift-off mask in the central region; and   milling the sensor materials using the lift-off mask such that sensor materials in the first and the second end regions are removed and sensor materials in the central region remain.   
     
     
         17 . The method of  claim 10 , further comprising:
 prior to forming the read sensor, depositing first and second bias layers in the first and the second end regions and over the first and the second lead layers;   wherein forming the read sensor further comprises:
 depositing sensor materials in the central region and over the first and the second bias layers in the first and the second end regions; 
 forming a lift-off mask in the central region; and 
 milling the sensor materials using the lift-off mask such that sensor materials in the first and the second end regions are removed and sensor materials in the central region remain, such that the first edge of the read sensor is disposed above an edge of the first bias layer and the second edge of the read sensor is disposed above an edge of the second bias layer. 
   
     
     
         18 . The method of  claim 10 , wherein a majority of the read sensor along a track width thereof lies above a plane extending through midpoints of the lead layers, the midpoints being positioned midway between upper and lower extents of the lead layers, the plane being parallel to planes of deposition of the read sensor and lead layers. 
     
     
         19 . The method of  claim 10 , wherein the entire read sensor along a track width thereof lies above a plane extending through midpoints of the lead layers, the midpoints being positioned midway between upper and lower extents of the lead layers, the plane being parallel to planes of deposition of the read sensor and lead layers.