Molded waveguides

Abstract

Chemically or biochemically active agents or other species are patterned on a substrate surface by providing a micromold having a contoured surface and forming, on a substrate surface, a chemically or biochemically active agent or fluid precursor of a structure. A chemically or biochemically active agent or fluid precursor also can be transferred from indentations in an applicator to a substrate surface. The substrate surface can be planar or non-planar. Fluid precursors of polymeric structures, inorganic ceramics and salts, and the like can be used to form patterned polymeric articles, inorganic salts and ceramics, reactive ion etch masks, etc. at the surface. The articles can be formed in a pattern including a portion having a lateral dimension of less than about 1 millimeter or smaller. The indentation pattern of the applicator can be used to transfer separate, distinct chemically or biochemically active agents or fluid precursors to separate, isolated regions of a substrate surface. Waveguide arrays, combinatorial chemical or biochemical libraris, etc. can be made. Differences in refractive index of waveguide and cladding can be created by subjecting the waveguide and cladding, made of identical prepolymeric material, to different polymerization or cross-linking conditions. Interferometers are defined by coupling arrays of waveguides, where coupling can be controlled by altering the difference in refractive index between cladding and waveguide at any desired location of the array. Alteration and refractive index can be created photochemically, chemically, or the like. Sensors also are disclosed, including biochemical sensors.

1 - 67 . (canceled)  
     
     
         68 . A method comprising: 
 providing an article having a contoured surface including at least one indentation defining a pattern;    forming at a first region proximate a substrate surface, in a pattern corresponding to the indentation pattern, a fluid precursor of a reactive ion etch mask; and    allowing the fluid precursor to harden to form a reactive ion etch mask at the first region of the substrate surface while leaving a second region proximate the substrate surface, contiguous with the first region, free of the species.    
     
     
         69 . A method as in  claim 68 , involving allowing the fluid precursor to harden to form a reactive ion etch mask at the first region of the substrate surface in a pattern corresponding to the indentation pattern and in an area including a portion having a lateral dimension of less than about 1 mm.  
     
     
         70 . A method as in  claim 68 , comprising forming the fluid precursor in the pattern on the surface by providing an amount of the fluid precursor on the substrate surface and pressing the contoured surface of the article into the precursor against the substrate surface.  
     
     
         71 . A method as in  claim 68 , further comprising exposing the substrate to reactive ion etch conditions and allowing at least a portion of the substrate surface at the second region to be etched by reactive ion etching.  
     
     
         72 . A method as in  claim 68 , wherein the surface is nonplanar.