Liquid crystal display device and manufacture method thereof

Abstract

A method of manufacturing a reflecting substrate in a liquid crystal display device is disclosed, comprising the steps of: (a) providing a substrate having a first metal layer, wherein the first metal layer is formed with at least one soft metal or the alloys thereof; and (b) forming an aluminum nitride layer on the first metal layer. The method of the present invention is capable of forming a rugged, shining, reflective layer on a transflective, or a reflection type TFT LCD with simple steps and low cost.

1 . A method of manufacturing a reflecting substrate, comprising the steps of: 
 (a) providing a transparent substrate having a first metal layer thereon, wherein the first metal layer is formed with at least one soft metal or the alloys thereof; and    (b) forming a layer of aluminum nitride on the first metal layer.    
     
     
         2 . The method of  claim 1 , wherein the first metal layer is light-reflective.  
     
     
         3 . The method of  claim 1 , wherein the soft metal is Al, Ag, Ni, Cu or Pt.  
     
     
         4 . The method of  claim 1 , wherein the layer of aluminum nitride is formed by reactive sputtering.  
     
     
         5 . The method of  claim 1 , further comprising forming a buffer layer between the first metal layer and the transparent substrate, and the buffer layer is made of Ti, titanium nitride, Mo, Cr or the alloys thereof.  
     
     
         6 . The method of  claim 1 , wherein the layer of aluminum nitride has a thickness of about 150 to about 1500 Å.