Coating apparatus, thin film forming method, thin film forming apparatus, and semiconductor device manufacturing method, electro-optic device and electronic instrument

Abstract

A coating apparatus coats a liquid material on a substrate in a coating chamber. A first liquid supply system that supplies the liquid material is provided in the coating chamber. A second liquid supply system is provided in the first liquid supply system that supplies a liquid that cleans or that deactivates the liquid material remaining in the coating chamber and/or in the first liquid supply system. A coating apparatus, a thin film forming method, a thin film forming apparatus, a semiconductor device manufacturing method, an electro-optic device, and an electronic instrument are provided that enable a high performance thin film with few defects and with a high degree of reproducibility to be obtained, that allow maintenance of the apparatus to be performed efficiently and safely, and that enable a thin film to be formed at low cost.

1 . A coating apparatus comprising: 
 a coating chamber with a stage for supporting a target substrate;    a first liquid supply system that supplies a first liquid to the coating chamber, the first liquid being for coating the target substrate; and    a second liquid supply system that supplies a second liquid to the first liquid supply system, the second liquid cleaning or deactivating the first liquid remaining in the first supply system.    
   
   
       2 . The coating apparatus according to  claim 1 , wherein 
 the first liquid supply system supplies the second liquid from the second supply system to the coating chamber to clean or deactivate the first liquid remaining in the coating chamber.    
   
   
       3 . The coating apparatus according to  claim 2 , wherein 
 the first liquid supply system includes a dispenser head with a plurality of nozzles through which the first liquid and the second liquid are supplied to the coating chamber.