Pattern generation methods and apparatuses

Abstract

A method may comprise emitting electromagnetic radiation onto a workpiece and storing data describing geometrical elements in a pattern. The electromagnetic radiation may be focused and/or reflected in a first direction, and a power level of the electromagnetic radiation may be modulated according to the stored data. A guiding rail may be moved in the first direction and a carriage may be moved in a second direction, each in one of a continuous and stepwise manner. The second direction may be substantially perpendicular to the first direction. A pattern may be exposed on the workpiece.

1 . A method comprising: 
 emitting electromagnetic radiation toward a workpiece;    storing data describing geometrical elements in a pattern;    moving a guiding rail in the first direction in a continuous or stepwise manner, and moving a carriage in a second direction in a continuous or stepwise manner, the second direction being substantially perpendicular to the first direction; and    exposing the pattern on the workpiece; wherein 
 the workpiece is kept at a fixed position during exposure.  
   
   
   
       2 .- 3 . (canceled)  
   
   
       4 . The method of  claim 1 , wherein the workpiece is positioned in a vertical, substantially vertical, horizontal, or substantially horizontal direction during exposure.  
   
   
       5 . The method of  claim 1 , wherein the laser is fixed to the guiding rail.  
   
   
       6 . The method of  claim 1 , wherein the laser is separate from the guiding rail.  
   
   
       7 .- 8 . (canceled)  
   
   
       9 . An apparatus for exposing a workpiece, comprising: 
 an optical system providing electromagnetic radiation in a first direction relative to a workpiece;    a guiding rail capable of moving in at least a first direction in one of a continuous or stepwise manner and including a carriage capable of moving in a second direction in one of a continuous or stepwise manner, the first and second directions being perpendicular or substantially perpendicular to each other; wherein    the workpiece is kept at a fixed position during exposure.    
   
   
       10 . The apparatus of  claim 9 , wherein the electromagnetic radiation includes at least one laser beam.  
   
   
       11 . The apparatus of  claim 9 , wherein the workpiece is positioned in a vertical, substantially vertical, horizontal or substantially horizontal direction during exposure.  
   
   
       12 . The apparatus of  claim 9 , wherein the laser is fixed to the guiding rail.  
   
   
       13 . The apparatus of  claim 9 , wherein the at least one laser is separated from the guiding rail.  
   
   
       14 . The apparatus of  claim 9 , wherein the modulator is arranged at a fixed distance from a source of the electromagnetic radiation.  
   
   
       15 .- 22 . (canceled)