US2008067930A1PendingUtilityA1
Organic light emitting display and manufactuirng method thereof
Assignee: SAMSUNG ELECTRONICS CO LTDPriority: Nov 28, 2003Filed: Nov 20, 2007Published: Mar 20, 2008
Est. expiryNov 28, 2023(expired)· nominal 20-yr term from priority
H10K 59/80522H10K 50/805H10K 59/805G02F 1/136H10K 71/00H10K 59/122H10K 59/12H10K 2102/3026
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Claims
Abstract
An organic light emitting display is provided, which includes: a first electrode formed on a substrate; a partition having an opening exposing the first electrode at least in part; an auxiliary electrode formed on the partition and having substantially the same planar shape as the partition; an organic light emitting member formed on the first electrode and disposed substantially in the opening; and a second electrode formed on the light emitting member and the auxiliary electrode.
Claims
exact text as granted — not AI-modified1 - 20 . (canceled)
21 . A method of manufacturing an organic light emitting display, the method comprising:
forming a plurality of first display electrodes; forming a partition having a plurality of opening exposing the first display electrodes at least in part; forming an auxiliary electrode on the partition; forming a plurality of organic light emitting members in the openings; and forming a second display electrode on the light emitting member and the auxiliary electrode, wherein the formation of the partition and the formation of the auxiliary electrode are performed by using a single lithography.
22 . The method of claim 21 , wherein the formation of the partition and the formation of the auxiliary electrode comprise:
sequentially depositing an insulating layer and a conductively layer; forming a first photoresist on the conductive layer; sequentially etching the conductive layer and the insulating layer using the first photoresist as an etch mask to form a conductor and the partition; ashing the first photoresist to form a second photoresist; and etching the conductor to form the auxiliary electrode using the second photoresist as an etch mask.
23 . The method of claim 21 , wherein the first display electrodes comprise a reflective material.
24 . The method of claim 21 , wherein the second display electrode contacts the light emitting member, the auxiliary electrode, and the partition.
25 . The method of claim 24 , wherein the second display electrode contacts a side of the partition at the opening.
26 . The method of claim 21 , wherein the second display electrode comprises transparent material.
27 . A method of manufacturing an organic light emitting display, the method comprising:
forming first and second semiconductor members including amorphous silicon or polysilicon; forming a gate line including a first gate electrode and a second gate electrode; forming a gate insulating layer between the first and the second semiconductor members and the gate line and the second gate electrode; forming a data line including a first source electrode, a voltage transmission line, and first and second drain electrodes; forming a passivation layer on the data line, the voltage transmission line, and the firs and the second drain electrodes; forming a pixel electrode on the passivation layer, the pixel electrode connected to the second drain electrode; forming a partition having an opening exposing the pixel electrode at least in part; forming an auxiliary electrode on the partition; forming an organic light emitting member in the opening; and forming a common electrode on the light emitting member and the auxiliary electrode.
28 . The method of claim 27 , wherein the formation of the partition and the formation of the auxiliary electrode comprise:
sequentially depositing an insulating layer and a conductively layer; forming a first photoresist on the conductive layer; sequentially etching the conductive layer and the insulating layer using the first photoresist as an etch mask to form a conductor and the partition; ashing the first photoresist to form a second photoresist; and etching the conductor to form the auxiliary electrode using the second photoresist as an etch mask.
29 . The method of claim 27 , wherein the pixel electrode comprises transparent material.
30 . The method of claim 27 , wherein the common electrode comprises transparent material.
31 . The method of claim 27 , wherein the auxiliary electrode has a resistivity lower than the common electrode.
32 . The method of claim 27 , wherein the second display electrode contacts the light emitting member, the auxiliary electrode, and the partition.
33 . The method of claim 32 , wherein the second display electrode contacts a side of the partition at the opening.Join the waitlist — get patent alerts
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