Selective area deposition and devices formed therefrom

Abstract

Patterned thin film layers ( 12 ) are applied to a substrate ( 10 ) surface by masking selective areas of a substrate surface, e.g., with a printed pattern ( 11 ) of a material such as an oil, and vapor-depositing thin film material. The masking material is subsequently removed.

1 . A method of depositing a patterned thin film layer on a surface of a substrate comprising:
 masking selected areas of substrate, and   vapor depositing a thin film on said masked substrate, whereby said thin film deposits on said substrate only on unmasked areas of said substrate.   
   
   
       2 . The method of  claim 1  wherein said masking material is removed after said thin film is deposited. 
   
   
       3 . The method of  claim 1  wherein said masking material is a chemical that is printed on said substrate surface. 
   
   
       4 . The method of  claim 1  wherein said thin film is formed of electrically conductive material. 
   
   
       5 . The method of  claim 1  wherein said thin film is an electrically resistive material. 
   
   
       6 . The method of  claim 1  wherein said thin film is a dielectric material. 
   
   
       7 . The method of  claim 1  wherein said masking material is an oil. 
   
   
       8 . The method of  claim 1 , further comprising the step of measuring a characteristic of said thin film during said vapor deposition, and terminating said vapor deposition when a desired value of said characteristic is reached.