Method of Patterning Self-Organizing Material, Patterned Substrate of Self-Organizing Material and Method of Producing the Same, and Photomask Using Patterned Substrate of Self-Organizing Material

Abstract

It is intended to provide a method of patterning a self-organizing material whereby a self-organizing material having a self-organization ability such as a nucleic acid can be aligned and immobilized in a desired manner on a substrate by using the imprint process, a patterned substrate of a self-organizing material and a method of producing the same, and a photomask. An immobilization layer containing a binder capable of binding to a self-organizing material is formed on a substrate. Then this immobilization layer is patterned by transferring an uneven pattern formed in a mold thereto by the imprint process. The self-organizing material is supplied onto the face having the uneven pattern of the immobilization layer transferred thereto. Thus, the self-organizing material is immobilized following the uneven pattern of the immobilization layer owing to the self-organization ability of the material per se and the binding ability of the binder contained in the immobilization layer.

1 . A method of patterning a self-organizing material, comprising: 
 forming, on a substrate, an immobilization layer containing a binding material having an ability of binding with the self-organizing material having a self-organizing ability;    patterning the immobilization layer by transferring a protrusion and recess pattern of a mold to the immobilization layer by imprinting process;    supplying the self-organizing material to that surface of the immobilization layer on which the protrusion and recess patterned is transferred; and    immobilizing the self-organizing material according to the protrusion and recess pattern of the immobilization layer by utilizing the self-organizing ability of the self-organizing material and the binding ability of the binding material contained in the immobilization layer.    
   
   
       2 . The method as set forth in  claim 1 , wherein the self-organizing material is a nucleic acid.  
   
   
       3 . The method as set forth in  1 , wherein the binding material is poly-L-lysine.  
   
   
       4 . The method as set forth in  1 , wherein the binding material is aminosilane.  
   
   
       5 . A method of producing a self-organizing material-patterned substrate in which a self-organizing material having a self-organizing ability is patterned in a predetermined pattern on the substrate, the method comprising: 
 the immobilization layer forming step including: 
 forming, on a substrate, an immobilization layer containing a binding material having an ability of binding with the self-organizing material having a self-organizing ability; and  
 patterning the immobilization layer by transferring a protrusion and recess pattern of a mold to the immobilization layer by imprinting process; and  
   the self-organizing material immobilizing step including: 
 supplying the self-organizing material to that surface of the immobilization layer on which the protrusion and recess patterned is transferred; and  
 immobilizing the self-organizing material according to the protrusion and recess pattern of the immobilization layer by utilizing the self-organizing ability of the self-organizing material and the binding ability of the binding material contained in the immobilization layer.  
   
   
   
       6 . The method as set forth in  claim 5 , wherein the self-organizing material is a nucleic acid.  
   
   
       7 . The method as set forth in  5 , wherein the binding material is poly-L-lysine.  
   
   
       8 . The method as set forth in  5 , wherein the binding material is aminosilane.  
   
   
       9 . A self-organizing material-patterned substrate on which a self-organizing material having a self-organizing ability is patterned in a predetermined pattern, the self-organizing material-patterned substrate comprising: 
 a substrate; and    an immobilization layer and a self-organizing material-patterned layer on the substrate,    the immobilization layer containing a binding material having an ability of binding with the self organizing material and having a protrusion and recess patterned on its surface, and    the self-organizing material-patterned layer being formed by immobilizing the self-organizing material in a recess portion of the immobilization layer by the self-organizing ability of the self-organizing material itself and the binding ability of the binding material.    
   
   
       10 . The self-organizing material-patterned substrate as set forth in  claim 9 , wherein the self-organizing material is a nucleic acid.  
   
   
       11 . The self-organizing material-patterned substrate as set forth in  9 , wherein the binding material is poly-L-lysine.  
   
   
       12 . The self-organizing material-patterned substrate as set forth in, wherein the binding material is aminosilane.  
   
   
       13 . A photomask comprising a self-organizing material-patterned substrate as set forth in  claim 9 .  
   
   
       14 . The self-organizing material-patterned substrate as set forth in  claim 9 , wherein a nucleic acid as the self-organizing material is modified with metal.  
   
   
       15 . The self-organizing material-patterned substrate as set forth in  claim 14 , wherein the metal is a typical metal.  
   
   
       16 . The self-organizing material-patterned substrate as set forth in  claim 14 , wherein the metal is a transition metal.  
   
   
       17 . The self-organizing material-patterned substrate as set forth in  claim 16 , wherein the transition metal includes at least one of gold, silver, platinum, palladium, iridium, rhodium, osmium, and ruthenium.  
   
   
       18 . The self-organizing material-patterned substrate as set forth in  claim 9 , wherein a pigment is inserted in a nucleic acid as the self-organizing material.  
   
   
       19 . The self-organizing material-patterned substrate as set forth in  claim 18 , wherein the pigment is acridine orange.