Multi-level optical structure and method of manufacture

Abstract

A multi-level optical device includes a substrate having a baseline level. At least one feature is disposed at a level above the baseline level. At least one feature is disposed at a level below the baseline level, or in the feature above the baseline level is located at a distance apart from the feature below the baseline level. The distance has an accuracy inn the range of approximately ±0.05 μm to less than approximately ±1.0 μm. A method of fabricating an optical device includes forming at least one feature at a level of above a baseline level of a substrate; and forming at least one feature at a baseline level below the baseline level of the substrate, wherein the feature at a level above the baseline level and the feature at a level below the baseline level are patterned in a single-mask step using a multi-level mask.

1 . A multi-level optical device, comprising: a substrate having a baseline level; at least one feature disposed at a level above said baseline level; at least one feature disposed at a level below said baseline level, wherein said at least one feature above said baseline level is located at a distance apart from said at least one feature below said baseline level; and said distance has an accuracy in a range of approximately ±0.05 μm to less than approximately ±1.0 μm.  
   
   
       2 . A multi-level optical device as recited in  claim 1 , wherein at least one other feature is disposed at another level above said baseline level.  
   
   
       3 . A multi-level optical device as recited in  claim 2 , wherein said another level is higher than said level.  
   
   
       4 . A multi-level optical device as recited in  claim 2 , wherein said another level is lower than said level.  
   
   
       5 . A multi-level optical device as recited in  claim 1 , wherein said at least one feature disposed at a level above said baseline level is a planar waveguide, and said at least one feature disposed at a level below said baseline level is a recess.  
   
   
       6 . A multi-level optical device as recited in  claim 1 , wherein said feature disposed above said baseline is a conductive element.  
   
   
       7 . A multi-level optical device as recited in  claim 1 , wherein said at least one feature disposed at said level above said baseline level is chosen from the group consisting essentially of a planar waveguide, a contact pad, and a passive optical device.  
   
   
       8 . A multi-level optical device as recited in  claim 2 , wherein said at least one feature at said another level above said baseline level is a conductive element, and said at least one feature at a level above said baseline level is a planar waveguide.  
   
   
       9 . A multi-level optical device as recited in  claim 1 , wherein said at least one feature disposed at a level above said baseline level are conductive elements and said conductive elements are disposed over a core layer.  
   
   
       10 . A multi-level optical device as recited in  claim 9 , wherein said core layer is photosensitive.  
   
   
       11 . A multi-level optical device as recited in  claim 9 , wherein said conductive elements are a mask for said core layer.  
   
   
       12 . A multi-level optical device as recited in  claim 1 , wherein said distance has an accuracy of approximately ±0,1 μm.  
   
   
       13 . A multi-level device as recited in  claim 1 , wherein said distance has an accuracy of less than approximately ±1.0 μm.  
   
   
       14 - 29 . (canceled)  
   
   
       30 . A multi-level optical device as recited in  claim 1 , wherein said range is approximately ±0.05 μm to approximately ±0.5 μm.  
   
   
       31 . A multi-level optical device as recited in  claim 1 , wherein said range is approximately +0.1 μm to approximately ±1.0 μm.  
   
   
       32 . A multi-level optical device as recited in  claim 1 , wherein said range is approximately ±0.05 μm to approximately ±0.75 μm.