Manufacturing process to produce litho sheet
Abstract
The present invention provides an aluminum alloy for lithographic sheet including about 0.05 wt % to about 0.25 wt % Si; about 0.25 wt % to about 0.4 wt % Fe; less than or equal to about 0.04 wt % Cu; less than or equal to about 0.25 wt % Mn; 0.31 wt % to 0.35 wt % Mg; less than or equal to about 0.03 wt % Zn; less than or equal to about 0.03 wt % Ti; and incidental impurities. Another aspect of the invention is a method of processing a lithographic sheet including the steps of providing an aluminum sheet; contacting the aluminum sheet with an electrolyte bath; and applying a current having a non-sinusoidal wave form with a constant peak voltage to said electrolyte bath.
Claims
exact text as granted — not AI-modified1 . An aluminum alloy comprising:
about 0.05 wt % to about 0.25 wt % Si; about 0.25 wt % to about 0.4 wt % Fe; less than or equal to about 0.04 wt % Cu; less than or equal to about 0.25 wt % Mn; 0.31 wt % to about 0.40 wt % Mg; less than or equal to about 0.03 wt % Zn; and less than or equal to about 0.03 wt % Ti;
2 . The alloy of claim 1 comprising Si ranging from about 0.8 wt % to about 0.12 wt %.
3 . The alloy of claim 1 comprising Fe ranging from about 0.28 wt % to about 0.32 wt %.
4 . The alloy of claim 1 comprising Zn ranging from 0.01 wt % to 0.03 wt %.
5 . The alloy of claim 1 comprising Ti in less than or equal to about 0.014 wt %.
6 . The alloy of claim 1 comprising Mg ranging from 0.31 wt % to about 0.35 wt. %.
7 . The alloy of claim 1 comprising less than or equal to 0.007 wt % Cu.
8 . An aluminum alloy comprising:
about 0.8 wt % to about 0.12 wt % Si; about 0.28 wt % to about 0.32 wt % Fe; less than or equal to about 0.007 wt % Cu; less than or equal to about 0.02 wt % Mn; 0.31 wt % to about 0.35 wt % Mg; less than or equal to about 0.03 wt % Zn; and less than or equal to about 0.014 wt % Ti;
9 . A method of producing a lithographic sheet comprising:
providing an aluminum sheet; contacting the aluminum sheet with an electrolyte bath; and applying a current having a non-sinusoidal wave form to said electrolyte bath at a constant peak voltage.
10 . The method of claim 9 wherein the wave form of the non-sinusoidal current is either symmetrical or asymmetrical and is generated by a thyristor power supply to provide a desired current density to the aluminum sheet by moving the switching point of the thyristor power supply.
11 . The method of claim 10 wherein the constant peak voltage ranges from about 35 to about 60 volts.
12 . The method of claim 10 further comprising applying the non-sinusoidal wave form current with a current density ranging from about 4 to about 12 A/dm 2 .
13 . The method of claim 12 comprising applying the non-sinusoidal wave form current for dwell times ranging from about 0.5 to about 3.0 seconds.
14 . The method of claim 10 wherein the electrolyte bath comprises a mineral acid in a concentration of less than about 35%.
15 . The method of claim 13 wherein the electrolyte bath comprises sulfuric, phosphoric, or sulfuric-phosphoric mixtures.
16 . The method of claim 15 wherein the electrolyte bath comprises less than 20 g/l.
17 . The method of claim 16 wherein the electrolyte bath comprises a temperature ranging from about 40° C. to about 100° C.
18 . The method of claim 9 wherein providing the aluminum sheet comprises an alloy comprising:
about 0.05 wt % to about 0.25 wt % Si; about 0.25 wt % to about 0.4 wt % Fe; less than or equal to about 0.04 wt % Cu; less than or equal to about 0.25 wt % Mn; 0.31 wt % to about 0.40 wt % Mg; less than or equal to about 0.03 wt % Zn; and less than or equal to about 0.03 wt % Ti;
19 . The method of claim 18 further comprising using a thyristor power supply to generate the current having a non-sinusoidal wave form, wherein the power supply is configured to provide a current with a desired current density applied to the aluminum sheet by moving the switching point of the thyristor power supply.
20 . The method of claim 19 wherein the electrolyte bath comprises sulphuric acid and then applying the pulse wave current comprises a current density ranging from about 4-12 A/dm 2 for dwell times of 0.5 to 3.0 seconds.Join the waitlist — get patent alerts
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